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VACUUM
SURFACE ENGINEERING, SURFACE INSTRUMENTATION
& VACUUM TECHNOLOGY
Volume 79, 2005
VACUUM
SURFACE ENGINEERING, SURFACE INSTRUMENTATION
Bead z oe ba & VACUUM TECHNOLOGY
SEVIE
Vacuum 79 (2005) VII-IX
www.elsevier.com/locate/vacuum
Contents
Volume 79 Numbers 1-2
AUTHORS ARTICLES
F. Mahboubi and M. Fattah Duplex treatment of plasma nitriding and plasma oxidation of plain carbon steel
D. Ma, S. Ma and K. Xu The tribological and structural characterization of nano-structured THSLN films
coated by pulsed-d.c. plasma enhanced CVD
Z. He, G. Zhao, W. Weng, P. Du, G. Shen The difference between the transverse and in-plane resistivity of vacuum
and G. Han evaporated cadmium sulfide (CdS) thin films
A. Aissa, M.-A. Zaibi and J.-P. Lacharme Interaction of hot Si(100)2 x 1 with water vapour
S.K. Hong, N. Hayashi, S. Ihara, S. Satoh Main-discharge formation and light emission in pure Ar gas at multi-atmospheric
and C. Yamabe pressure using the automatically pre-ionized plasma electrode
Q. Wan, X. Bai and X. Liu 37 Influence of nitrogen ion implantation on the aqueous corrosion behavior
of zircaloy- 4
W. Juan, L. Yajiang and M. Haijun 45 Study of diffusion bonding of Fe-28AlI alloy with austenitic stainless steel
in vacuum
X.-Y. Li, P.-O. Wu, B. Tang and J.-P. Celis 52 Fatigue behavior of plasma surface modified T+ 6AI-4 V alloy
M. Nazarov, S. Bukesov, D. Young Jeon 58 Effects of low energy electrons on the luminescence properties of phosphors
and A. Streltsov and vacuum display characteristics
S. Sen 63 A study on kinetics of Cr,C-coated high-chromium steel by thermo-reactive
diffusion technique
D.L. Cocke, R. Schennach, M.A. Hossain, 71 The low-temperature thermal oxidation of copper, Cu302, and its influence
D.E. Mencer, H. McWhinney, J.R. Parga, on past and future studies
M. Kesmez, J.A.G. Gomes
and MLY.A. Mollah
M. Zhang, B. Gu, L. Wang and Y. Xia Preparation and characterization of (100)-textured diamond films obtained
by hot-filament CVD
M. Zhan, W. Gao,T . Tan, H. He, J. Shao Study of AloO3/MgF2 HR coatings at 355 nm
and Z. Fan
T. Tsvetkova, S. Takahashi, A. Zayats, 94 Near-field optical mapping of the ion-implanted patterns fabricated in
P. Dawson, R. Turner, L. Bischoff, amorphous silicon carbide
O. Angelov and D. Dimova-Malinovska
VItl Volume Contents | Vacuum 79 (2005) VII-IX
T.T svetkova, S. Takahashi, A. Zayats, 100 =‘ Fabrication of nano-scale optical patterns in amorphous silicon carbide with
P. Dawson, R. Turner, L. Bischoff, focused ion beam writing
O. Angelov and D. Dimova-Malinovska
SHORT COMMUNICATION
G. Carter 106 Surface ripple amplification and attenuation by sputtering with diametrically
opposed ion fluxes
Volume 79 Numbers 3-4
B. Kim, D.-W. Kim and G.-T. Park 111 Prediction of plasma-induced DC bias using polynomial neural network
R. Knizikevicius 119 Simulation of silicon etching through a fluorocarbon layer
B. Wang,W . Eberhardt and H. Kiick 124 Adhesion of PVD layers on liquid crystal polymer pretreated by oxygen-
containing plasma
B. Wang,W . Eberhardt and H. Kick 129 Adhesion of PVD layers on liquid crystal polymer pretreated by oxygen-
containing plasma
X. Chen, H. Qiu, P. Wu, F.Wang, L. Pan 134 Effect of annealing temperature on characteristics of NiggFes, films sputter
and Y. Tian deposited on SiO2/Si (10 0)
D. Han, S.B. Moon, K. Park, B. Kim, 140 Modelling of plasma etching process using radial basis function network and
K.K. Lee and N.J. Kim genetic algorithm
Y. Kang, C. Zhou, S. Gong and H. Xu 148 _~— Electrochemical behavior of low-pressure plasma-sprayed AtCu-Fe—Cr
quasicrystalline coating
H. Giimiis and O. Kabadayi 155 Comparison of theoretical stopping powers and application to the range
calculation for bismuth ions in Si and SiOz
V. Senthilkumar, M. Thamilselvan, 163 Characterization of p-type In-Sb thin films prepared by vacuum evaporation
K. PremNazeer, S.K. Narayandass,
D. Mangalaraj, B. Karunagaran,
K. Kim and J. Yi
S. Barzilai, A. Raveh and N. Frage Annealing of niobium coatings deposited on graphite
N. Joshi, A.K. Debnath, D.K. Aswal, 178 Morphology and resistivity of Al thin films grown on Si (111) by molecular
K.P. Muthe, M. Senthil Kumar, S.K. Gupta beam epitaxy
and JV. Yakhmi
S.M. Aouadi, T.M aeruf, M. Debessai Zirconium nitride/nickel nanocomposite structures
and P. Filip
A.M. Mahajan, L.S. Patil, J.P. Bange TEOS-PECVD system for high growth rate deposition of SiOz films
and D.K. Gautam
J.R. Sobiecki and T.W ierzchon 203 Glow discharge assisted oxynitriding of the binary TiGAI2Cr2Mo titanium
alloy
J. Laimer, S. Haslinger, W. Meissl, J. Hell Investigation of an atmospheric pressure radio-frequency Capacitive plasma jet
and H. Stori
Y. Salt, A. Hasanogu, i. Salt, S. Keleser, 215 ~— Pervaporation separation of ethylacetate-water mixtures through a crosslinked
S. Ozkan and S. Dincer poly( vinylalcohol) membrane
E.M. Alkoy and P.J. Kelly The structure and properties of copper oxide and copper aluminium oxide
coatings prepared by pulsed magnetron sputtering of powder targets
Volume Contents | Vacuum 79 (2005) VII-IX IX
G.-h. Kim, C.-l. Kim and A.M. Efremov 231 Effect of gas mixing ratio on MgO etch behaviour in inductively coupled BCl3/Ar
plasma
S. Mroz 241 Composition of the first atomic layers of (001)-oriented AuCug3 crystal
measured with the use of directional Auger electron spectroscopy at 400 K<
7<1000 K
Z.D. Sha, X.M.Wu and L.J. Zhuge Structure and photoluminescence properties of SiC films synthesized by the
RF-magnetron sputtering technique
S.A. Kulinich and M. Farzaneh On wetting behavior of fluorocarbon coatings with various chemical and
roughness characteristics
VOLUME CONTENTS
AUTHOR INDEX
