SVC - 54th Annual Technical Conference Proceedings

25 Pages·2011·1.556 MB·English

SVC
SOCIETW
VACUUM
COATERS
54th Annual
Technical Conference

Proceedings
,
April 16-21 2011
Chicago, IL USA
Copyright 0 2011 by Society of Vacuum Coaters
71 Pinon Hill Place NE Albuquerque, NM 87122-1914 USA
Telephone [phone] Fax [phone]
E-mai I svci [email protected]
Web Site www.svc.org
Executive Director: Vivienne Harwood Mattox
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Annual Technical I I I I I I I I I I I I I I I I I I IIIIIIIII
Conference Proceedings
Prior Proceedings available in print:
19th Annual Technical Conference Proceedings (1 976) ISBN 1-878068-00-8
20th Annual Technical Conference Proceedings (1 977) ISBN 1-878068-01 -6
21 st Annual Technical Conference Proceedings (1 978) ISBN 1-878068-02-4
22nd Annual Technical Conference Proceedings (1 979) ISBN 1-878068-03-2
24th Annual Technical Conference Proceedings (1 981) ISBN 1-878068-04-0
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30th Annual Technical Conference Proceedings (1 987) ISBN 1-878068-06-7
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37th Annual Technical Conference Proceedings (1 994) ISBN 1-878068- 3-X
38th Annual Technical Conference Proceedings (1 995) ISSN 0737-5921
39th Annual Technical Conference Proceedings (1 996) ISSN 0737-5921
40th Annual Technical Conference Proceedings (1 997) ISSN 0737-5921
41 st Annual Technical Conference Proceedings (1 998) ISSN 0737-5921
42nd Annual Technical Conference Proceedings (1 999) ISSN 0737-5921
43rd Annual Technical Conference Proceedings (2000) ISSN 0737-5921
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Proceedings available on CD-ROM:
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Notice: The manuscripts in the SVC Conference Proceedings have not been peer reviewed. SVC assumes no
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Copyright 0 201 1 by Society of Vacuum Coaters
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Society of Vacuum Coaters
54th Annual Technical Conference Proceedings
Published by:
Society of Vacuum Coaters
71 Pinon Hill Place NE
Albuquerque, NM 871 22-1 91 4 USA
Telephone [phone]
Fax [phone]
E-mail [email protected]
Web Site www.svc. org
ISSN 0737-5921
Printed in the United States of America
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~VC1Il11111I I I I I I I I I I I I I I I I I I I Table of Contents
Keynote Presentation
-
1 Magnetron Sputtering and its Applications Milestones and Future Challenges
G. Brauer, R. Bandorf, K. Bewilogua, W. Diehl, B. Szyszka, and M. Vergohl, Fraunhofer Institute for Surface
Engineering and Thin Films IST, Braunschweig, Germany .............................................................................................. 3
Business Topics Session
2 Managing Risk and Maximizing ROI on R&D Investment with a Stage-Gate" Process
J.O. McGeever, Technology Assessment International, Rolling Meadows, IL ............................................................... 11
3 Technical Standards for Ensuring Consistency, Reliability and Performance of Vacuum Coatings
P Hatto, lonbond Ltd., Consett, United Kingdom: M. Gee, National Physical Laboratory, Materials Division,
Teddington, United Kingdom: and M. Griepentrog, Bundesanstalt fur Materialforschung und -PrUfung (BAM),
Berlin, Germany ............................................................................................................................................................. 15
-
4 Manufacturing Factory Safety The Impact on Operations
S.M. Simons and H.I. Foster, California Code Compliance, Inc., Saratoga,CA ............................................................ 21
Coatings for Cleantech Energy Conversion, Storage and Related Processes
5 Thermochromics and Nanothermochromics: New Options for Energy Efficient Fenestration
S.-Y. Li, G.A. Niklasson, and C.G. Granqvist, Department of Engineering Sciences, The Angstrom Laboratory,
Uppsala University, Uppsala, Sweden 29
6 The Effects and Optimisation of 0, Gas Flow During Electron Beam Deposition on the Electrochromism
of Very Thin Films of NiO
M. Neeves and F. Placido, Thin Film Centre, School of Science and Engineering, University of the West of
Scotland, Paisley, United Kingdom ............................................................................................................................... 35
7 The Sustainability Benefits of Suspended Particle Device (SPD) Light-Control Technology: Energy
Efficiency, Individual Well-Being, and Security
G.M. Sottile, Research Frontiers Incorporated, Woodbury, NY ..................................................................................... 41
Emerging Tech nolog ies
8 New Method of Regulation of Cathode-Target Sputtering in a Magnetron
V.V. Zhurin, Colorado Advanced Technology LLC, Fort Collins, CO; and P.A. Tsygankov and N.G. Elistratov,
Bauman State Technical University, Moscow, Russian Federation ............................................................................... 49
9 A Novel RF Plasma Power Supply Approach
P Wiedemuth, R. Merte, M. GIUck, and T. Kirchmeier, HUETINGER Elektronik GmbH + Co. KG,
Freiburg, Germany ......................................................................................................................................................... 56
10 Carbon Containing Ceramics Deposited by Physical Vapour Deposition Methods
V. Vishnyakov and J. Colligon, Dalton Research Institute, Manchester Metropolitan University, Manchester,
United Kingdom ............................................................................................................................................................. 59
11 A New Protective Removable Treatment for Antique Metallic Handworks Realized by Plasma Assisted
Technologies
C. Misiano, P. Matarazzo, and M. Pezzilli, Romana Film Sottili, Anzio, Italy: E. Angelini, Politecnico di Torino,
Torino, Italy: and G. Ingo, CNR Montelibretti, Rome, Italy ............................................................................................. 66
12 Single Sided Ultra-Barrier Oxide Films on Flexible Substrates, Deposited Using High Speed Atomic Layer
Deposition Based on Substrate Translation
E.R. Dickey and W.A. Barrow, Lotus Applied Technology, Hillsboro, OR 70
13 Atomic Layer Deposition for Continuous Roll-to-Roll Processing
S.M. George, P.R. Fitzpatrick, and Z.M. Gibbs, Departments of Chemistry and Chemical Engineering,
University of Colorado, Boulder, CO .............................................................................................................................. 76
14 Continuous ALD Deposition on Moving Flexible Polymer Substrates
P.S. Maydannik, T.O. Kaariainen, K. Lahtinen, and D.C. Cameron, ASTRaL, Lappeenranta University of
Technology, Mikkeli, Finland; and P. Johansson and J. Kuusipalo, Paper Converting and Packaging
Technology, (TUT/PAK), Tampere University of Technology, Tampere, Finland ............................................................ 82
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Table of Contents I I I I I I I I I I I I I I I I I I IIIIIIIII
Vacuum Processes and Coatings for Health Care Applications
15 Plasma-Based Approach to Promote the Covalent Attachment of Biomolecules to Polymers
S.G. Walton and E.H. Lock, Plasma Physics Division, U.S. Naval Research Laboratory, Washington, DC; and
S.H. North and C.R. Taitt, Center for Bio/Molecular Science and Engineering, US. Naval Research
Laboratory, Washington, DC ... 89
16 New TiOx Films with Oriented Growth and their Photocatalytic and Antibacterial Effects
Z. Michalcik and M. Horakova, Department of Material Science, Technical University of Liberec, Liberec,
Czech Republic; N. Martin, Departement MN2S, lnstitut FEMTO-ST, Besanqon, France; I. Slamborova,
Department of Chemistry, Technical University of Liberec, Liberec, Czech Republic: P. Spatenka, Department
of Material Science, Technical University of Liberec, Liberec, Czech Republic and Department of Physics,
University of South Bohemia, Ceske Budejovice, Czech Re
Technical University of Liberec, Liberec, Czech Republic .... 93
Heureka Post-Deadline Recent Developments Session
17 Simple and Cheap Process for Protecting Polycarbonate From Wiping
H. Gruenwald, Leibniz Institute for Plasma Science and Technology (INP), Greifswald, Germany and Surface
Chemistry, Niddatal, Germany; J. Gunther, Plastics Institute (KIMW), Ludenscheid, Germany; J. Schafer and
R. Foest, Leibniz Institute for Plasma Science and Technology (INP), Greifswald, Germany: and D. Malecha,
Plastics Institute (KIMW), Ludenscheid, Germany ....................................................................................................... 101
18 Linear Hollow Cathode Arc for Deposition of CrxN Films
P. Mordente, Uppsala University, Angstrom Laboratory, Uppsala, Sweden and Mahle Metal Leve S.A.,
SZio Paulo, Brazil; H. Barankova, Uppsala University, Angstrom Laboratory, Uppsala, Sweden;
R. Banfield, Mahle Metal Leve S.A., S2o Paulo, Brazil: and L. Bardos, Uppsala University, Angstrom
Laboratory, Uppsala, Sweden ..................................................................................................................................... 105
19 Employing Pulse Thermal Processing to Develop a Flexible CdTe Solar Cell for Web Coaters
S.L. Murray, Oak Ridge National Laboratory, Oak Ridge, TN: A.R. Klein and C.S. Murray, General Atomics,
San Diego, CA; K.A. Schroder and I.M. Rawson, Novacentrix, Austin, TN; T. Ju and B.M. Evans 111, Oak Ridge
National Laboratory, Oak Ridge, TN: D. Tillett, General Atomics, San Diego, CA: C.E. Duty, R.D. Ott, C.A. Blue,
and J.D. Rivard, Oak Ridge National Laboratory, Oak Ridge, TN: and T. Gessert and R. Noufi, National
Renewable Energy Laboratory, Golden, CO ................................................................................................................ 109
20 Hitting the Energy Sweet Spot: How to Make High Quality Aluminum Doped Zinc Oxide Films
A. Anders, R. Mendelsberg, S. Lim, and Y. Zhu, Lawrence Berkeley National Laboratory, Berkeley, CA ...................1 14
High Power Impulse Magnetron Sputtering (HIPIMS)
21 Reactive HiPlMS of Oxides for Optical Coatings
M. Vergohl, R. Bandorf, G. Brauer, S. Bruns, and 0. Werner, Fraunhofer Institute for Surface Engineering and
Thin Films IST, Braunschweig, Germany 121
22 High-Rate Reactive Deposition of Transparent Zirconium Dioxide Films Using High-Power Pulsed DC
Magnetron Sputtering
J. Vlcek, J. Rezek, J. Lazar, J. Houska, and R. Cerstvy, Department of Physics, University of West Bohemia,
Plzen, Czech Republic ................................................................................................................................................. 131
23 Microstructure, Oxidation and Tribological Properties of TiAlCNNCN Coatings Deposited by Reactive
HlPlMS
G. Kamath*, P.Eh. Hovsepian, and A.P. Ehiasarian, Nanotechnology Centre for PVD Research, Sheffield
Hallam University, Sheffield, United Kingdom: and I. Petrov, Frederick Seitz Materials Research Laboratory,
University of Illinois at Urbana Champaign, Urbana, IL. .135
24 CrN PVD Coatings, Deposited by HIPIMS, Bipolar Dual Cathode Magnetron Sputtering and Electron Beam
Processes for Coining Dies Applications
J. Fernandez, J.
Cordovilla, Spai 142
25 Successful Industrial Application of HIPIMS' Technology
I. Kolev, F. Papa, A. Campiche, R. Tietema, and T. Krug, Hauzer Techno Coating BV, Venlo, The Netherlands 149
*SVC Sponsored Student
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~VC1Il11111I I I I I I I I I I I I I I I I I I I Table of Contents
26 Highly lonised Gas-Flow Sputtering
R. Bandorf, D. Loch, and G. Brauer, Fraunhofer Institute for Surface Engineering and Thin Films IST,
Braunschweig, Germany ............................................................................................................................................. 155
27 P-type CuO Deposited on Polyethylene Terephthalate Substrate Using High Power Impulse Magnetron
Sputtering
Y.-H. Chen, L.-C. Chang, M.-Y. Hsiao, and J.-L. He, Department of Materials Science and Engineering,
Feng Chia University, Taichung, Taiwan. ...................................................................................................................... 160
28 Time-Resolved Ion Energy Distribution Functions in a HiPlMS Plasma Using a Retarding Field Analyzer
F! Poolcharuansin* and J.W. Bradley, Department of Electrical Engineering and Electronics, University of
Liverpool, Liverpool, United Kingdom 166
29 Deposition Rate Loss in High Power Impulse Magnetron Sputtering: Understanding Through
Computational Modeling
D. Lundin, Plasma & Coatings Physics Division, Linkoping University, Linkoping, Sweden; C. Huo,
N. Brenning, and M.A. Raadu, Division of Space and Plasma Physics, Royal Institute of Technology,
Stockholm, Sweden; and U. Helmersson, Plasma & Coatings Physics Division, Linkoping University,
Linkoping, Sweden ...................................................................................................................................................... 172
30 Deposition of Transparent and Conductive In,Sn,O,, Using DC and HiPlMS Reactive Magnetron Sputtering
F! Butler*, A. Cook, and H. Assender, Department of Material Science, University of Oxford, Oxford, United
Kingdom; and F! Kelly, Surface Engineering Group, Manchester Metropolitan University, Manchester,
United Kingdom ........................................................................................................................................................... 178
31 AZO Coatings Deposited by Reactive HiPlMS for Modified TCO Properties on Polymeric Web
P.M. Barker*, G.T. West, and P.J. Kelly, Surface Engineering Group, Manchester Metropolitan University,
Manchester, United Kingdom; J.W. Bradley, Department of Electrical Engineering, University of Liverpool,
Liverpool, United Kingdom; and H. Assender, Department of Materials, University of Oxford, United Kingdom ....... 183
Large Area Coating
32 Multi-Point Spectral Optical Monitoring for the Next Decade
6. Barney, NVision Instruments Inc., Santa Cruz, CA .................................................................................................. 191
33 High Rate EB-PVD in Industrial Applications: Evaporation From Hot Crucibles versus Water Cooled
Crucibles
J. Faber, E. Reinhold, and T. Niederhausen, VON ARDENNE Anlagentechnik GmbH, Dresden, Germany ... 195
34 A New Generation of Plasma-Based Electron Beam Sources with High Power Density as a Novel Tool For
High-Rate PVD
F! Feinaeugle, G. Mattausch, S. Schmidt, and F.-H. Roegner, Fraunhofer Institute for Electron Beam and Plasma
Technology FEP, Dresden, Germany ............................................................................................................................ 202
35 IT0 Revisited: A Study of Coating Properties Obtained with Sintered Ceramic Rotary Targets Aiming at
Display Applications
F! Lippens and M. Haldemann, Umicore Thin Film Products, Balzers, Principality of Liechtenstein. .210
36 High Rate Reactive Aluminium-Doped Zinc Oxide (AZO) Deposition by Dual Rotatable Magnetron
Sputtering
D. Monaghan, V. Bellido-Gonzalez, M. Audronis, and 6. Daniel, Gencoa Ltd., Liverpool, United Kingdom ..............2. 15
37 A Room Temperature, Low-Stress Bonding Process to Reduce the Impact of Use Stress on a Sputtering
Target Assembly
A. Hartnett, J. Matteau, R. Spraker, and 0. Knio, Indium Corporation, Clinton, NY ..... .221
38 The Superiority of the DC Power Supplies Over the Pulsed DC Power Supplies For TCO Materials
(AZO, ITO)
P. Ozimek, W. Glazek, K. Obrebski, L. Zyskowski, M. Zelechowski, and P. Rozanski, HUETINGER Electronic
Sp. z o.o., Zielonka, Poland 226
39 Anti-Reflective Coatings by Plasma Enhanced Chemical Vapor Deposition on Large Area Substrates
J. Madocks and W. Seaman, General Plasma, Inc., Tucson, AZ 229
40 Factors in Arc Parameter Selection on Large Scale Deposition Proces
D. Carter and H. Walde, Advanced Energy Industries Inc, Fort Collins, CO 234
*SVC Sponsored Student
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Table of Contents I I I I I I I I I I I I I I I I I I IIIIIIIII
Optical Coating
41 Pitfalls in the Characterization of Optical Thin Films
A. Macleod and C. Clark, Thin Film Center Inc., Tucson, AZ 243
42 Monte Carlo Analysis of Random Thickness Errors in Triple Bandpass Coating Designs
D. Fuller, W. Hasan, and H. Zhang, Precision Optics Division, FLlR Systems Inc., Wilsonville, OR 248
43 Properties and Problems of Extended Zone High Reflectance Coatings
C. Clark and A. Macleod, Thin Film Center Inc., Tucson, AZ 253
44 Antireflective Coatings for Optical Lenses Based on Plasma-Etched Melamine
U. Schulz, Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Jena, Germany; H. Mandl
and R. Nottebohm, Agfa-Gevaert Healthcare GmbH, Munchen, Germany: and C. Godeker and N. Kaiser,
Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Jena, Germany ............................................ 257
45 Highly Durable DLC Coatings for Plastic Transparencies and Optics
J.E. Yehoda, J. Taylor, and F.M. Kimock, Morgan Technical Ceramics - Diamonex, Allentown, PA ........................... 261
46 Deposition of Optical Coatings on Plastics Using Poly-para-xylylene
T. Neubert, A. Gaida, W. Huwer, K. Nagel, and M. Vergohl, Fraunhofer Institute for Surface Engineering and
Thin Films IST, Braunschweig, Germany 265
47 Optimization and Deposition of Wide-Angle Broadband Antireflective Coatings
J. Zhang, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai,
People’s Republic of China and Graduate School of Chinese Academy of Sciences, Beijing, People’s
Republic of China: and H. He, M. Fang, and Z. Fan, Shanghai Institute of Optics and Fine Mechanics,
Chinese Academy of Sciences, Shanghai, People’s Republic of China ...................................................................... 270
48 Optical Thin Films with High Laser Stability
D. Ristau, Laser Zentrum Hannover e.V., Department of Laser Components, QUEST Centre of Quantum
Engineering and Space-Time Research, Hannover, Germany .................................................................................... 276
49 Technical Review of a New ECR-PECVD Reactor and Characterization of Undoped and Ce-Doped Silicon
Oxynitride Thin Films
R. Dabkowski*, P. Wilson, J. Wojcik, and P. Mascher, Department of Engineering Physics and Centre for Emerging
Device Technologies, McMaster University Hamilton, Ontario, Canada ..................................................................... 283
50 Optical Films with HCS Ion Source and Ion Assisted Deposition
V.V. Zhurin, Colorado Advanced Technology LLC, Fort Collins, CO; and E.V. Klyuev and A.I. Sidorov,
Research Institute and Enterprise, Podolsk, Russia 290
51 Advantages and Advancements in Biased Targe
A.J. Cooper, S. Antrazi, and K. Knieriem, 4Wave In 295
52 Optimizing Sweep Pattern Design for E-Beam Deposited High Precision Optical Coatings
D. Radgowski, M. Tuttle, and A. Karlicek, Cyber Materials LLC, Auburndale, MA; and E. Speyerer and
M. Gevelber, Boston University, Manufacturing Engineering, Brookline, MA .............................................................. 299
53 High Performance Optical Coatings Deposited Using Closed Field Magnetron Sputtering
D.R. Gibson, I.T. Brinkley, and J.L. Martin, Applied Multilayers, LLC, Cheyenne, WY ................................................ 306
54 Process Control in Sputtering of Optical Coatings
P Frach, H. Bartzsch, D. Gloess, and K. Taeschner, Fraunhofer-lnstitut fur Elektronenstrahl- und
Plasmatechnik FEP, Dresden, Germany ...... .311
55 Characterisation and Comparison of Dia
Pulsed-DC Hollow Cathode PECVD
United Kingdom ... .317
56 Behavior of Thre
.323
Plasma Processing
57 Diagnostics of Low and Atmospheric Pressure Plasmas by Means of Mass Spectrometry
J. Benedikt, D. Ellerweg, and A. von Keudell, Research Department Plasmas with Complex Interactions,
Ruhr-University, Bochum, Germany ............................................................................................................................ 331
*SVC Sponsored Student
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~VC1Il11111I I I I I I I I I I I I I I I I I I I Table of Contents
58 Hollow Cathode Plasma Activation in Reactive Gas Atmosphere
B. Zimmermann and F. Fietzke, Fraunhofer Institute for Electron Beam and Plasma Technology FEP, Dresden,
Germany; and W. Moller, Institute of Ion Beam Physics and Materials Research, Helmholtz-Zentrum
Dresden-Rossendorf, Dresden, Germany 337
59 Predicting the Metallic Composition of Sputter Deposited Complex Thin Films
K. Van Aeken*, F. Boydens, S. Mahieu, W.P. Leroy, and D. Depla, Department of Solid State Sciences, Ghent
University, Ghent, Belgium .......................................................................................................................................... 343
60 Particle-in-Cell Monte Carlo Simulation for Process Analysis and Development
M. Siemers, A. Pflug, C. Schwanke, and B. Szyszka, Fraunhofer Institute for Surface Engineering and Thin
Films IST, Braunschweig, Germany. 348
61 Frequency Probe Measurements in Electron Beam Generated Processing Plasmas
D.R. Boris, S.G. Walton, and R.F. Fernsler, Plasma Physics Division, U.S. Naval Research Laboratory,
Washington, DC ........................................................................................................................................................... 352
62 Optimization of Plasma Characteristics in Plasma-Assisted Atomic Layer Deposition: Effect on Film
Structure and Process Enhancement Prospects
T.O. Kaariainen, S. Lehti, M.-L. Kaariainen, and D.C. Cameron, ASTRaL, Lappeenranta University of
Technology, Mikkeli, Finland ... 357
63 Deposition of Functional Plasma Polymers by Control of Film Growth Conditions
D. Hegemann, Empa, Swiss Federal Laboratories for Materials Science and Technology,
St. Gallen, Switzerland ................................................................................................................................................. 362
64 Nitrogen Doping of Graphene Using Electron Beam Generated Plasmas
M. Baraket and S.G. Walton, Plasma Physics Division, U.S. Naval Research Laboratory, Washington, DC;
R. Stine, W.K. Lee, and P.E. Sheehan, Chemistry Division, U.S. Naval Research Laboratory, Washington, DC;
and J.T. Robinson, Electronics Division, U.S. Naval Research Laboratory, Washington, DC ..................................... 367
65 Properties of Piezoelectric AIN Layers Deposited by Reactive Pulse Magnetron Sputtering
H. Bartzsch, M. Gittner, D. Gloess, and F! Frach, Fraunhofer Institute for Electron Beam and Plasma
Technology FEP, Dresden, Germany; and T. Herzo
Non-Destructive Testing IZFP, Dresden, Germany 370
Poster Session
66 Dispersion-Free Reflective Phase Retarder for Few-Cycle Femtosecond Pulses
G. Tempea, Femtolasers Produktions GmbH, Wien, Austria ....................................................................................... 379
67 Optimizing Thermal Vacuum Deposition Uptime by Increasing Evaporation Source Material Pack Density
J. Hisert, Indium Corporation, Clinton, NY .................................................................................................................. 381
68 Toward the Synthesis of Bactericidal Films
C. Walker, E. Cortes, and C. Gallagher, Department of Physics and Astronomy, Rowan University, Glassboro,
NJ; R. Krchnavek, Department of Electrical and Computer Engineering, Rowan University, Glassboro, NJ;
G.A. Caputo, Department of Chemistry and Biochemistry, Rowan University, Glassboro, NJ; R. Ostrum, Bone
and Joint Institute, Cooper University Hospital, Camden, NJ; and J. Hettinger, Department of Physics and
Astronomy, Rowan University, Glassboro, NJ 384
69 Linear Ion Source for Steel Sheet Surface Etching
D.-G. Kim, S. Lee, T. Elangovan, and J.-K. Kim, Korea Institute of Materials Science, Changwon, South Korea 386
70 High Density Plasma Assisted Sputtering System for Advanced Coating Processes
S. Lee, J.-K. Kim, J.-W. Kang, (2.4. Kim, and D.-G. Kim, Korea Institute of Materials Science, Changwon,
South Korea ................................................................................................................................................................. 389
71 End-Hall Ion Source with Shielded Hot Filament Cathode
V.V. Zhurin, Colorado Advanced Technology LLC, Fort Collins, CO; E.V. Klyuev and A. Sidorov Research
Institute and Enterprise, Podolsk, Russia; and M. Choi, VAC-TEC, Ltd., Paju-City, Korea 392
72 A Fluidized-Bed Sputter Deposition System for Coating Microparticles
D.M. Baechle, J.D. Demaree, J.K. Hirvonen, and E.D. Wetzel, U.S. Army Research Laboratory,
Aberdeen Proving Ground, MD. ................................................................................................................................... 396
*SVC Sponsored Student
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Table of Contents I I I I I I I I I I I I I I I I I I IIIIIIIII
73 The Effects of Substrate Defects and Particles on ALD Barrier Layer Water Vapor Transmission
Performance
W.A. Barrow and E.R. Dickey, Lotus Applied Technology, Hillsboro, OR .................................................................... 402
74 Tribological and Corrosion Properties of CrN/Cr Bylayers Obtained by Reactive Magnetron Sputtering
A.U. Paladines, A. Ruden, J.M. Gonzalez, J.S. Restrepo, and F. Sequeda, Laboratorio de Recubrimientos
Duros y Aplicaciones lndustriales (RDAI), Universidad del Valle, Valle, Colombia .407
75 Characteristics of Plasma Scalds in Multilayer Dielectric Films
L. Xiaofeng, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai,
China and Graduate School of Chinese Academy of Sciences, Beijing, China; Z. Yuan'an and L. Dawei,
Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, China:
H. Guohang and S. Yongguang, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of
Sciences, Shanghai, China and Graduate School of Chinese Academy of Sciences, Beijing, China; and
F. Zhengxiu and S. Jianda, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences,
Shanghai, China ........................................................................................................................................................... 414
76 Control of Reactive Deposition Process by Stabilization of the Power Supply Work
J. Kazuss, V. Kozlov, and E. Machevski, Sidrabe Inc., Riga, Latvia ............................................................................ 419
77 Dynamic VHF-PECVD Deposition with Linear Plasma Sources for Amorphous and Microcrystalline Silicon
Solar Cells (Overview)
M. Albert, C. Strobel, and 6. Leszczynska, lnstitut fur Halbleiter- und Mikrosystemtechnik, Technische Universitat
Dresden, Dresden, Germany: T. Zimmermann, IEF5-Photovoltaik, Forschungszentrum Julich
GmbH, Julich, Germany; J. Kuske, Forschungs- und Applikationslabor Plasmatechnik GmbH, Dresden,
Germany; and J.W. Bartha, lnstitut fur Halbleiter- und Mikrosystemtechnik, Technische Universitat Dresden,
Dresden, Germany ....................................................................................................................................................... 423
78 Design of a Servo Controlled Rotating Substrate Drum Containing Deposition Height Adjustment
M. Parkinson, 6. Vaning, J. Gural, and G.G. Amatucci, Department of Materials Science and Engineering,
Rutgers, The State University of New Jersey, North Brunswick, NJ ... .428
79 TiOx Surface Properties in Dependency on Glancing Angle Deposition Parameters
F! Spatenka, Department of Material Science, Technical University in Liberec, Liberec, Czech Republic and
Department of Physics, University of South Bohemia, Ceske Budejovice, Czech Republic; Z. Michalcik,
Department of Material Science, Technical University in Liberec, Liberec, Czech Republic: N. Martin,
Departement MN2S, lnstitut FEMTO-ST, Besanqon, France; and P. Bartos and P. Kriz, Department of Physics,
University of South Bohemia, Ceske Budejovice, Czech Republic ............................................................................. 431
80 Vacuum Quality Measurement with Autoresonant Ion Trap Mass Spectrometers
G.A. Brucker, Brooks Automation, Inc., Chelmsford, MA ............................................................................................ 437
Symposium on Coating Advances and its Impact on the Future of the
Vacuum Coating Industry
81 Technology Gap Analysis of Vacuum Coated Materials for Flexible OLED Display and Lighting
Applications
R. Ma, P.A. Levermore, P Mandlik, H. Pang, and J.J. Brown, Universal Display Corporation, Ewing, NJ ..................4 41
82 Decreased Cancer Cell VEGF Synthesis on Polymer Nanometer Surface Features
L. Zhang, Department of Chemistry, Brown University, Providence, RI: and T.J. Webster, School of
Engineering and Department of Orthopaedics, Brown University, Providence, RI 447
83 Impact of Thin Film Coatings on the Performance of Highly Energy-Efficien
L. Boman, J. Meade, C. Stoessel, and R. Wipfler, Southwall Technologies Inc., Palo Alto, CA .................................. 452
84 Study of a PECVD Process Using Homogeneous Dielectric Barrier Discharges at Atmospheric Pressure
L. Maechler, C. Cioarec, I. Enache, N. Naude, and H. Caquineau, Laboratoire Plasma et Conversion
d'Energie, Universite de Toulouse, Toulouse, France and CNRS, Toulouse, France: F. Massines, CNRS,
Perpignan, France; and N. Gherardi, Laboratoire Plasma et Conversion d'Energie, Universite de Toulouse,
Toulouse, France and CNRS, Toulouse, France .......................................................................................................... 457
85 High Stability Optical Coatings by Employing Gradient Index Designs
K. Starke, Cutting Edge Coatings GmbH, Hannover, Germany: and D. Ristau, Laser Zentrum Hannover e.V.,
Hannover, Germany 463
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86 Sustainability of Indium and Gallium Supplies in the Face of Emerging Markets
M.D. Murphy, Indium Corporation of America, Grove City, OH; and C. Mikolajczak, Indium Corporation of
America, Turin, Italy ..................................................................................................................................................... 468
87 Hard Coatings as a Design Element for Highly Stressed Engine Components
T. Hosenfeldt, Y. Musayev, and E. Schulz, Schaeffler Technologies GmbH & Co. KG, Herzogenaurach,
Germany ...................................................................................................................................................................... 470
Symposium on Manufacturing and Technology for Thin Film Photovoltaics
88 High Efficiency Rotatable Sputtering Targets for ClGS Thin Film Photovoltaics
J. Heindel, A. Kastner, and M. Schlott, Thin Film Materials Division, W.C. Heraeus GmbH, Hanau, Germany;
A. Seapan, Heraeus Materials Technology LLC, Chandler, AZ; and C. Simons, Thin Film Materials Division,
W.C. Heraeus GmbH, Hanau, Germany. 479
89 Vertically Aligned Solar Cells for Transparent Conductor Free Roll to Roll Solar Cell Manufacturing
P.D. Lane, Carbonlite Converting Equipment Limited, Littleborough, United Kingdom; and A.J. Topping, MFN
Technology Limited, Oxon, United Kingdom ............................................................................................................... 484
90 Evaluation of Atmospheric Plasma Surface Modification for Continuous Processing of Solar Cells
R.A. Wolf, Enercon Industries Corporation, Menomonee Falls, WI ............................................................................. 488
91 Atomic Layer Deposition on Polymers for Ultralow Water Vapor Transmission Rates: The Ca Test
J.A. Bertrand* and S.M. George, Departments of Chemistry and Chemical Engineering, University of Colorado,
Boulder, CO ................................................................................................................................................................. 492
92 Technological Trends in Thin Film Si and ClGS Photovoltaic Technology
R. Schlatmann, PVcomB (Competence Center Thin Film and Nanotechnology for Photovoltaics Berlin),
Helmholtz Zentrum Berlin fur Materialien und Energie GmbH, Berlin-Adlershof, Germany. .497
93 Influence of Process Parameter and Magnetic Field Strength on DC Magnetron Sputtered 2nO:Al Films
From Ceramic Targets
V. Sittinger, W. Dewald, W. Werner, and B. Szyszka, Fraunhofer Institute for Surface Engineering and Thin
Films IST, Braunschweig, Germany 502
94 Zn0:Al for ClGS Solar Modules Deposited by Reactive Sputtering from Rotatable Magnetron
V. Linss, J. Strumpfel, and T. Fleischer, VON ARDENNE, Dresden, Germany; R. Menner, T.M. Friedlmeier,
and W. Wischmann, ZSW, Stuttgart, Germany; and T. Niesen, S. Visbeck, and J. Palm, AVANCIS,
Munchen, Germany. 508
95 The Effects of Process Power on Arc Rate and Nodule Formation during Sputtering of Aluminum-Doped
Zinc Oxide
K. Nauman, Advanced Energy Industries, Inc., Fort Collins, CO ................................................................................. 514
96 Nanoparticles/lntermediate Reflective Layer Approach for Light Trapping in Silicon Tandem Solar Cells
M. Creatore, J.B. Jongen, and M.V. Ponomarev, Department of Applied Physics, Eindhoven University of
Technology, Eindhoven, The Netherlands; H.T. Beyene, Department of Applied Physics, Eindhoven University
of Technology, Eindhoven, The Netherlands and Materials Innovation Institute, M2i, Delft, The Netherlands;
and M.C.M. van de Sanden, Department of Applied Physics, Eindhoven University of Technology, Eindhoven,
The Netherlands and FOM Institute for Plasma Physics Rijnhuizen, Nieuwegein, The Netherlands. .519
Tribological and Decorative Coating
97 Applications of Rolling Element Bearings with Vaccum-Deposited Coatings
G.L. Doll, The Timken Company, Canton, OH ............................................................................................................. 525
98 Cr-W-C-N Nanocomposite Coatings via Reactive Magnetron Sputtering
M.J. Walock*, Department of Physics, University of Alabama at Birmingham, Birmingham, AL and
Laboratoire Bourguignon des Materiaux et Procedes, Cluny, France; Y. Zou, Department of Physics,
University of Alabama at Birmingham, Birmingham, AL; D. Lagadrillere and C. Nouveau, Laboratoire
Bourguignon des Materiaux et Procedes, Cluny, France; and A.V. Stanishevsky, Department of Physics,
University of Alabama at Birmingham, Birmingham, AL .............................................................................................. 530
*SVC Sponsored Student
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Table of Contents I I I I I I I I I I I I I I I I I I IIIIIIIII
99 High Rate Deposition of Hard a-C:H Coatings Using Microwave Enhanced Plasma CVD
I. Bialuch and K. Bewilogua, Fraunhofer Institute for Surface Engineering and Thin Films IST, Braunschweig,
Germany: and M. Gunther, S. Peter, and F. Richter, Institute of Physics, Technical University of Chemnitz,
Chemnitz, Germany. 537
100 Duplex a-C:H:Si Coatings of Inner Surfaces by Means of DC-PACVD
C. Forsich and D. Heim, University of Applied Sciences, Wels, Austria; and T. Mueller, Rubig GmbH & Co KG
Anlagentechnik, Wels, Austria ..................................................................................................................................... 541
101 New Rapid Metallizer for Fully Automated PVD-Metallization in the Packaging Industry
B. Gebhardt, K.-D. Steinborn, T. Steinborn, G. Buschbeck, and M. Falz, VTD Vakuumtechnik Dresden GmbH,
Dresden, Germany ....................................................................................................................................................... 547
102 Structure and Properties of Ticx and W-C:H Layers Deposited by Plasma Activated High Rate Electron
Beam Evaporation
J.-P. HeinO, 0. Zywitzki, and T. Modes, Fraunhofer Institute for Electron Beam and Plasma Technology FEP,
Dresden, Germany ....................................................................................................................................................... 551
103 Enhancing Gear Life with Nanocomposite Coatings Deposited by Arc Evaporative PVD
L. Chen and P. Hatto, lonbond Ltd., Consett, United Kingdom, and M. Vaidhianathasamy and
B. Shaw, Design Unit, Newcastle University, Newcastle Upon Tyne, United Kingdom 557
104 The Role and Value of Low Friction Coatings in Sheet Metal Forming Applications
B. Janoss and C. Flattery, lonbond North America, Madison Heights, MI 561
Vacuum Web Coating
105 Strategies for Developing Thin-Film Encapsulation for Organic Electronics
S. Graham, Woodruff School of Mechanical Engineering, Georgia Institute of Technology, Atlanta, GA ...... 567
106 Vacuum Roll-to-Roll Technologies for Transparent Barrier Films
J. Fahlteich, N. Schiller, M. Fahland, S. Straach, S. Gunther, and C. Brantz, Fraunhofer Institute for Electron
Beam and Plasma Technology FEP, Dresden, Germany ............................................................................................. 573
107 Barrier Properties of High Barrier Coating on Plastic Substrate by PE-CVD Roll Coater
T. Okimoto and H. Tamagaki, Kobe Steel, Ltd., Takasago, Japan ............................................................................... 580
108 Roll-to-Roll Atomic Layer Deposition Technology for Moisture Barriers on Flexible Substrates
M. Soderlund, P. Soininen, and S. Sneck, Beneq, Vantaa, Finland ............................................................................. 584
109 Increasing Li-S Battery Cycle Life, and Improving Safety, through Application of a Variety of Coating
Techniques
J. Affinito, Y. Mikhaylik, C. Scordilis-Kelley, and C. Campbell, Sion Power Corporation, Tucson, AZ .... 589
110 (Magneto-)Optical and Mechanical Properties of Thin Metallic Films on PET Substrates
K. Schmidegg and V. Rinnerbauer, Hueck Folien Ges.m.b.H., Baumgartenberg, Austria: and L.D. Sun,
M. Hohage, and P. Zeppenfeld, lnstitut fur Experimentalphysik, Johannes Kepler Universitat Linz, Linz, Austria ..... 593
111 Dynamic VHF-PECVD Technique for Flexible Substrate Coating
B. Leszczynska, C. Strobel, and M. Albert, Semiconductor and Microsystems Technology Laboratory,
Dresden University of Technology, Dresden, Germany; T. Zimmermann, lnstitut fur Energieforschung -
Photovoltaik (IEF-5), Forschungszentrum Julich, Julich, Germany: J. Kuske, Forschungs- und
Applikationslabor Plasmatechnik GmbH, Dresden, Germany; and J.W. Bartha, Semiconductor and
Microsystems Technology Laboratory, Dresden University of Technology, Dresden, Germany . 599
112 Atmospheric Pressure-to-Vacuum Transition Modules for Web Processing
R. Crucet, B. Dotter, J. Doehler, and V. Cannella, Energy Conversion Devices, Auburn Hills, MI ............................... 604
113 Target Life KWatt-Hours vs. Target Depth Study on Multipurpose Roll to Roll Web Coaters
K.P. Barnes, Multek Flexible Circuits Sheldahl Materials, Northfield, MN ................................................................... 608
114 Roll-Coater Applications for Energy and Environment
D. Mount, ULVAC Technologies, Inc., Methuen, MA ................................................................................................... 61 1
115 High Performance Roll-to-Roll Refractive Index Matched to Optically Clear Adhesive IT0 Coating Films for
rojected-Capacitive Touch Screens Application
F. Li, Multek Flexible Circuits, Inc., Northfield, MN; and T. Faris, Vampire Optical Coating, Inc., Baltimore, OH ........6 17
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