Table Of Content49th Annual
Technical Conference
Proceedings
April 22–27, 2006
Washington, D.C. USA
Copyright © 2006 by the Society of Vacuum Coaters
71 Pinon Hill Place NE • Albuquerque, NM 87122-1914 USA
Telephone 505/856-7188 • Fax 505/856-6716
E-mail [email protected]
Web Site www.svc.org
Executive Director: Vivienne Harwood Mattox
Technical Director: Donald M. Mattox
Annual Technical
Conference Proceedings
Prior Proceedings available in print:
19th Annual Technical Conference Proceedings (1976) ISBN 1-878068-00-8
20th Annual Technical Conference Proceedings (1977) ISBN 1-878068-01-6
21st Annual Technical Conference Proceedings (1978) ISBN 1-878068-02-4
22nd Annual Technical Conference Proceedings (1979) ISBN 1-878068-03-2
24th Annual Technical Conference Proceedings (1981) ISBN 1-878068-04-0
28th Annual Technical Conference Proceedings (1985) ISBN 1-878068-05-9
30th Annual Technical Conference Proceedings (1987) ISBN 1-878068-06-7
31st Annual Technical Conference Proceedings (1988) ISBN 1-878068-07-5
32nd Annual Technical Conference Proceedings (1989) ISBN 1-878068-08-3
33rd Annual Technical Conference Proceedings (1990) ISBN 1-878068-09-1
34th Annual Technical Conference Proceedings (1991) ISBN 1-878068-10-5
35th Annual Technical Conference Proceedings (1992) ISBN 1-878068-11-3
36th Annual Technical Conference Proceedings (1993) ISBN 1-878068-12-1
37th Annual Technical Conference Proceedings (1994) ISBN 1-878068-13-X
38th Annual Technical Conference Proceedings (1995) ISSN 0737-5921
39th Annual Technical Conference Proceedings (1996) ISSN 0737-5921
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45th Annual Technical Conference Proceedings (2002) ISSN 0737-5921
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47th Annual Technical Conference Proceedings (2004) ISSN 0737-5921
48th Annual Technical Conference Proceedings (2005) ISSN 0737-5921
49th Annual Technical Conference Proceedings (2006) ISSN 0737-5921
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Society of Vacuum Coaters
49th Annual Technical Conference Proceedings
Published by:
Society of Vacuum Coaters
71 Pinon Hill Place NE
Albuquerque, NM 87122-1914 USA
Telephone 505/856-7188
Fax 505/856-6716
E-mail [email protected]
Web Site www.svc.org
ISSN 0737-5921
Printed in the United States of America
ii
2006 Conference
Program Committee
General Program Chair
Ludvik Martinu, École Polytechnique, Canada
Assistant Program Chair
Ric Shimshock, MLD Technologies LLC
Director of TACs
Hana Baránková, Uppsala University, Sweden
Tribological & Decorative Coating
Roel Tietema, Hauzer Techno Coating BV, The Netherlands
Gary L. Doll, Timken Research
Jolanta Klemberg-Sapieha, École Polytechnique, Canada
Optical Coating
Ian Stevenson, Denton Vacuum, LLC
Bryant Hichwa, Sonoma State University
Plasma Processing
Scott Walton, US Naval Research Laboratory
Arutiun Ehiasarian, Sheffield Hallam University, UK
Falk Milde, VON ARDENNE Anlagentechnik GmbH, Germany
Process Control & Instrumentation
J. Grant Armstrong, Carberry Technologies
David Chamberlain, MKS Instruments, Inc.
Large Area Coating
Michael Andreasen, VACUUM EDGE
Johannes Strümpfel, VON ARDENNE Anlagentechnik GmbH, Germany
Emerging Technologies and Heuréka! Session
Hana Baránková, Uppsala University, Sweden
Ladislav Bárdos, Uppsala University, Sweden
Vacuum Web Coating
Charles Bishop, C.A. Bishop Consulting Ltd., UK
Gregory Tullo, SE Associates, Inc.
Smart Materials
Carl Lampert, Star Science
Ric Shimshock, MLD Technologies
Claes G. Granqvist, Uppsala University, Sweden
Bernd Szyszka, Fraunhofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany
Frederik Krebs, Risø National Laboratory, Roskilde, Denmark
Innovators Showcase
Frank T. Zimone, Denton Vacuum, LLC
Education Committee Chair
S. Ismat Shah, University of Delaware
Exhibit Committee Chair
Cathi Baker, AEI
“Meet the Experts” Corner
Donald M. Mattox, SVC Technical Director
Conference Administrator
Vivienne Harwood Mattox, SVC Executive Director
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Table of Contents
Plenary Session and Keynote Address
11 Optical Communications: A Glance Back, then a Focus on Now and the Future
Plenary Speaker: Dr. Ed Murphy, Chief Technology Officer for the Components and Modules
Product Group of JDS Uniphase, Bloomfield, CT ......................................................................................................3
12 The Use of Drug-eluting Stents in the Treatment of Coronary Artery Disease - Past, Present and Future
Keynote Speaker: George A. Stouffer, MD, Henry A. Foscue Distinguished Professor of Medicine
and Cardiology and Director of the Heart Center of the University of North Carolina, Chapel Hill, NC ...................10
Emerging Technologies
13 Modification of Film Structure in Pulsed and Inductively-coupled-plasma assisted Pulse Sputtering
E. Kusano, Advanced Materials Science Research and Development Center, Kanazawa Institute of
Technology, Hakusan, Ishikawa, Japan ...................................................................................................................15
14 Investigation of Reactively Sputtered Titania Thin Films Prepared by DC, Pulsed and Highly Ionized
Pulsed Power Magnetron Sputtering
R. Bandorf, M. Vergöhl, and K. Schiffmann, Fraunhofer Institute for Surface Engineering and Thin Films IST,
Braunschweig, Germany; and T. Wallendorf, IfU GmbH, Lichtenau, Germany ........................................................21
15 Materials for Very Large-Area Solar Reactors for Photobiological or Photoelectrochemical Hydrogen
Production from Water
D.M. Blake and C.E. Kennedy, National Renewable Energy Laboratory, Golden, CO ............................................27
16 Niobium Oxide Film Deposition Using a High-Density Plasma Source
R. Chow, M.A. Schmidt, and A.W. Coombs, Lawrence Livermore National Laboratory, Livermore, CA; and
J. Anguita and M.J. Thwaites, Plasma Quest Limited, Hook, United Kingdom ........................................................31
17 Comparison of Current and Emerging Surface Treatment Technologies
A. Yializis and R. Ellwanger, Sigma Technologies International, Tucson, AZ; and R. Wolf, Enercon Industries
Corporation, Menomonee Falls, WI .........................................................................................................................36
18 Characterization of Hybrid Atmospheric Plasma in Air and Nitrogen
H. Baránková, L. Bárdos, D. Söderström, and L.-E. Gustavsson, Uppsala University, Angstrom Laboratory,
Plasma Group, Uppsala, Sweden ............................................................................................................................41
19 Surface Modification by a Plasma Accelerator with Closed Electron Drift
W. K. Choi, Korea Institute of Science and Technology, Seoul, Korea; J. Cho, Toray Saehan, Inc., Seoul,
Korea; Y. Ermakov and D.V. Skobeltsyn, Institute of Nuclear Physics of the Lomonosov, Moscow, Russia ............44
10 Room-temperature Industrially-scaled Pulsed Laser Deposition of Coatings for Wear-protection, Low-
friction and Decorative Applications
W. Waldhauser and J.M. Lackner, JOANNEUM RESEARCH Forschungsgesellschaft mbH, Laser Center
Leoben, Niklasdorf, Austria ......................................................................................................................................50
11 Room Temperature Solder Bonding of Sputtering Targets to Backing Plates
A. Duckham, J.S. Subramanian, J. Newson, M. Brown, Y. Lin, and Z. He, Reactive NanoTechnologies,
Hunt Valley, MD ........................................................................................................................................................55
12 Concept for Lightweight Spaced-Based Deposition Technology
M.L. Fulton, Ion Beam Optics Inc., Thousand Oaks, CA; and A. Anders, Lawrence Berkeley National
Laboratory, Berkeley, CA ..........................................................................................................................................60
13 Properties of a Non-thermal Radio Frequency Atmospheric Pressure Plasma Jet (APPJ)
K.-D. Weltmann, R. Foest, E. Kindel, H. Lange, and M. Stieber, Institute for Low-Temperature Plasma
Physics (INP), Greifswald, Germany ........................................................................................................................65
Heuréka! Post-Deadline Recent Developments Session
14 Organic Vapor Phase Deposition (OVPD): An Emerging Technology for OLED Manufacturing
M. Schwambera, AIXTRON AG, Aachen, Germany .................................................................................................73
15 Pulsed Laser Deposition with a High Average Power Fiber Laser
T. Amberla, M. Rekow, J. Köngäs, and H. Asonen, Corelase Oy, Tampere, Finland; T. Salminen, N. Viitanen,
M. Kulmala, P. Vuoristo, and M. Pessa, Tampere University of Technology, Tampere, Finland; and
R. Lappalainen, University of Kuopio, Kuopio and Picodeon Ltd., Helsinki, Finland ...............................................79
16 Expanding the List of Candidate Materials for Reactive Gas Control With Target Voltage Feedback
V. Bellido-Gonzalez, B. Daniel, J. Counsell, and D. Monaghan, Gencoa, Liverpool, United Kingdom ....................83
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Table of Contents
17 Advances in High Power Pulse Reactive Magnetron Sputtering
R. Chistyakov and B. Abraham, Zpulser, LLC, Mansfield, MA; and W.D. Sproul, Reactive Sputtering
Consulting LLC, Fort Collins, CO .............................................................................................................................88
Joint Session: Biomedical and Pharmaceutical Applications of Vacuum Processes and
Coatings
18 Progress in the Development of Photolytic Oxygenation Device Based on the Interaction of UV Light
with a Semiconducting Titanium Dioxide Thin Film
R.J. Gilbert, Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA;
B.F. Monzyk, Battelle Memorial Institute, Columbus, OH; K.A. Dasse, Levitronix Medical, Waltham, MA;
and P.M. Martin, Pacific Northwest National Laboratories, Richland WA .................................................................95
19 Influence of the Surface Properties of Plasma Modified Polystyrene on Cell Morphology and
Spreading
D.P. Dowling, School of Electrical, Electronic and Mechanical Engineering, Dublin, Ireland; I. Miller, School
of Biomolecular and Biomedical Science, Conway Institute, Dublin, Ireland; P. Duggan and G. Byrne,
School of Electrical, Electronic and Mechanical Engineering, Dublin, Ireland; and W. Gallagher, School of
Biomolecular and Biomedical Science, Conway Institute, Dublin, Ireland .............................................................100
20 Biomedical Applications of Thin Films Deposited by Plasma Polymerization
C. Oehr, Fraunhofer Institute for Interfacial Engineering and Biotechnology, Stuttgart, Germany .........................105
21 Extending the Biocompatibility of Polyurethane Surfaces in Blood Contact by Pulsed Laser
Deposited Thin Films
J.M. Lackner and W. Waldhauser, JOANNEUM RESEARCH Forschungsgesellschaft mbH, Laser Center
Leoben, Niklasdorf, Austria; R. Major and B. Major, Polish Academy of Sciences, Institute for Metallurgy
and Materials Science, Kraków, Poland; R. Kustosz, Fundacja Rozwoju Kardiochirurgii, Zabrze, Poland;
and E. Czarnowska, Department of Pathology, Children's Memorial Health Institute, Warsaw, Poland .................111
22 Hard and Protective DLC Coatings for Medical Applications
R. Hauert, Swiss Federal Laboratories for Materials Testing and Research, Empa Dübendorf, Switzerland ........115
23 Wettability and Adhesion Studies of Silicon-Titanium Oxide Based Biocompatible Coatings Deposited
by PECVD
G.R. Prasad, National Centre for Plasma Science and Technology, Dublin, Ireland; M.M. Kumar,
National Institute for Cellular Biotechnology, Dublin City University, Dublin, Ireland; S.M. Daniels, National
Centre for Plasma Science and Technology, Dublin, Ireland; D.C. Cameron, ASTRaL, Lappeenranta
University of Technology, Mikkeli, Finland; and M. Clynes, National Institute for Cellular Biotechnology,
Dublin City University, Dublin, Ireland ....................................................................................................................118
24 New Thin Film Treatments of Dental and Orthopaedic Implants to Improve Their Osseointegration
C. Misiano, Romana Film Sottili, Anzio, Italy; and R. Scandurra, University of Roma 1, Rome, Italy ....................123
25 Adhesion of Hybrid Poly (ethylene glycol) – Soy Protein Hydrogels to Plasma Treated Polymer
Surfaces
R. Snyders and O. Zabeida, Department of Engineering Physics, Ecole Polytechnique, Montreal, Quebec,
Canada; K. Shingell and C. Roberge, Bioartificial Gel Technologies, Montreal, Quebec, Canada; and
L. Martinu and J.E. Klemberg-Sapieha, Department of Engineering Physics, Ecole Polytechnique,
Montreal, Quebec, Canada ....................................................................................................................................126
Joint Session: Processes, Materials, and Coating Systems for Flexible Electronics
26 Scale-up of Thermal Evaporation Processes for Large-Area Coatings of “Small Molecule” Organic
Light-Emitting Diode Materials
J.M. Grace, D.R. Freeman, and N.P. Redden, Eastman Kodak Company, Rochester, NY; and J. Klug,
Deutsche Bank AG, New York, NY .........................................................................................................................133
27 Ultrabarrier Protective Coatings for Lithium Thin Film Batteries and Thin Film Photovoltaics
M.E. Gross, L.C. Olsen, W.D. Bennett, C.C. Bonham, P.M. Martin, G.L. Graff, and S. Kundu, Pacific
Northwest National Laboratory, Richland, WA .......................................................................................................139
28 Flexible Organic Electronics: The Role of Plasma Deposition in Multi-layer Permeation Barrier
Technology
M. Creatore, V.I.T.A. Lohmann, M.A. Blauw, and M.C.M. van de Sanden, Department of Applied Physics,
Eindhoven University of Technology, Eindhoven, The Netherlands .......................................................................143
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Table of Contents
29 Room-Temperature Crystallization by using RF Plasma
H. Ohsaki, Y. Shibayama, M.Suzuki, and A. Kinbara, Research Center for Advanced Science and
Technology, The University of Tokyo, Tokyo, Japan; H. Yashiro, Application Laboratory, Rigaku
Corporation, Akishima, Japan; and T. Watanabe, Research Center for Advanced Science and Technology,
The University of Tokyo, Tokyo, Japan ...................................................................................................................147
30 Plasma-Assisted Atomic Layer Deposition of AlO on Polymers
2 3
E. Langereis, S.B.S. Heil, M. Creatore, M.C.M. van de Sanden, and W.M.M. Kessels, Department of
Applied Physics, Eindhoven University of Technology, Eindhoven, The Netherlands ............................................151
Large Area Coating
31 Surface Resistivity Distribution of SnO Coatings Deposited Using a Rectangular Filtered Vacuum Arc
2
Deposition System
R.L. Boxman, V.N. Zhitomirsky, and Z. Abunie, Electrical Discharge and Plasma Laboratory, Tel-Aviv
University, Tel-Aviv, Israel .......................................................................................................................................157
32 Minimizing the Picture Frame Effect on “Cut-size” Glass in Architectural Glass Coaters by Simple
Modifications
M. Geisler, R. Trassl, A. Kastner, and M. List, Applied Films, Alzenau, Germany ..................................................162
33 What Architects Want from Large Area Coatings
D. McCann, Viracon, Owatonna, MN .....................................................................................................................166
34 Cross Corner Effect in Rectangular Magnetron Sputtering: Experiments and Monte Carlo Simulation
Y. Yang*, X. Liu, X. Chen, and L. Cha, Department of Electronic Engineering, Tsinghua University, Beijing,
China; and S. Xu and C. Fan, HIVAC Technology Co. Ltd, Shenzhen, China .......................................................173
35 The Growth and Future for Large Area Architectural Coatings
F. Wallin, AFG Industries, Inc., Kingsport, TN ........................................................................................................178
36 The Impact of Power Supply Arc Response on Production Yield and Field Reliability
D. J. Christie, Advanced Energy Industries, Inc., Fort Collins, CO ........................................................................183
37 Advantages of Using Rotating Cylindrical ITO Targets for Large Area Coating Applications
A. Blondeel, H. Delrue, S. Matthews, and J. Van Holsbeke, Bekaert Advanced Coatings, Deinze, Belgium,
and W. De Bosscher, Bekaert Advanced Coatings, Zulte, Belgium .......................................................................187
38 High Target Utilization for ITO of More Than 60% With a New Planar Magnetron Cathode
M. Scherer, T. Fritz, M. Klosch, and J. Pistner, Leybold Optics GmbH, Alzenau, Germany ...................................192
39 High Power RF and MF Systems for Flat Panel Display Applications
D. Ochs and T. Rettich HÜTTINGER Elektronik GmbH + Co. KG, Freiburg, Germany .........................................197
40 Deposition Source Design Adapted to Vaporizing Temperature Sensitive Materials
M. Long, J.M. Grace, D.R. Freeman, N.P. Redden, and B.E. Koppe, Eastman Kodak Company,
Rochester, NY; and R.C. Brost, Eastman Kodak Company, Albuquerque, NM .....................................................201
41 Large Area EB-PVD of Silver Based Super-Reflectors
E. Reinhold, J. Faber, C. Deus, and H. Obst, VON ARDENNE Anlagentechnik GmbH, Dresden, Germany ........205
42 Performance Comparison of Silver Sleeved Rotary Targets with Planar Targets
G.M. Wityak, Academy Corporation, Albuquerque, NM; and A. Blondeel and W. De Bosscher,
Bekaert Advanced Coatings, Deinze, Belgium .......................................................................................................211
43 Three Dimensional Plasma Simulations with a Parallelized Particle-in-Cell Monte Carlo Approach
M. Siemers, A. Pflug, and B. Szyszka, Fraunhofer Institute for Surface Engineering and Thin Films IST,
Braunschweig, Germany ........................................................................................................................................216
Optical Coating
44 Strategies for In-Situ Evaluation of Optical Layer Stacks in Large-Area In-Line Production Systems
C. Deus and H. Proehl, VON ARDENNE Anlagentechnik GmbH, Dresden, Germany ..........................................223
45 Direct Optical Monitoring in Intermittent Mode
A. Zoeller, M. Boos, R. Goetzelmann, H. Hagedorn, and W. Klug, Leybold Optics, Alzenau, Germany ................229
46 Low Angle Shift Infrared Blocking Filter using Silver-Dielectric Thin Films
G. Ockenfuss, JDSU, Santa Rosa, CA ..................................................................................................................235
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Table of Contents
47 A New Approach to Blocked Multi-Cavity Filters
D. Cushing, Tucson, AZ .........................................................................................................................................239
48 Correction of Optical Wafers to Lambda/1000 Thickness Uniformity by Selective Deposition Through
an Optimally Designed Multi-aperture Mask
J. Arkwright, CSIRO Industrial Physics, Lindfield, Australia ...................................................................................244
49 Research on Design Method of Uniformity Masking for Flat Planetary Fixture
M. Fang, K. Yi, and Z.X. Fan, R&D Center for Optical Thin Film Coatings, Shanghai Institute of Optics
and Fine Mechanics, Chinese Academy of Sciences, Shanghai, China ...............................................................249
50 Progress Toward Developing a Durable High-Temperature Solar Selective Coating
C.E. Kennedy and H. Price, National Renewable Energy Laboratory (NREL), Golden, CO .................................254
51 Properties of Indium Tin Oxide Deposited Using Reactive Closed Field Magnetron Sputtering
D.R. Gibson, I.T. Brinkley, G.H. Hall, E.M. Waddell, and J.M. Walls, Applied Multilayers Ltd., Coalville,
United Kingdom ......................................................................................................................................................260
52 Deposition of Multilayer Optical Films and Rugate Filters Deposited by Reactive Magnetron Sputtering
M. Vergöhl, C. Rickers, U. Kricheldorf, K. Schiffmann, and P. Giesel, Fraunhofer Institute for Surface
Engineering and Thin Films IST, Braunschweig, Germany; and R. Dittrich, IfU GmbH, Lichtenau, Germany;
and U. Richter, Sentech Instruments GmbH, Berlin, Germany ..............................................................................265
53 Influence of Nanosized Metal Clusters on the Generation of Strong Colors and Controlling of their
Properties through Physical Vapor Deposition (PVD)
R. Domnick, identif GmbH, Erlangen, Germany; M. Bauer, Attophotonics Biosciences GmbH,
Wiener-Neustadt, Austria and Max F. Perutz Laboratories, Vienna, Austria; S. Genov and R. Friedel,
identif GmbH, Erlangen, Germany; G. Bauer, Siemens, Erlangen, Germany; and M. Belzner, identif GmbH,
Erlangen, Germany ................................................................................................................................................271
54 Filter Design for AMLCD Full-Color Displays Compatible with Night Vision Devices
R.R. Willey, Willey Optical, Consultants, Charlevoix, MI ........................................................................................275
55 In Situ Ellipsometry and Monte-Carlo Simulation Studies of the Role of Ion Bombardment in the
Growth of Optical Films
A. Amassian, P. Desjardins, and L. Martinu, Regroupement Québécois sur les Matériaux de Pointe
(RQMP) and Department of Engineering Physics, École Polytechnique, Montréal, Québec, Canada ..................280
56 Thin Film Technology Applied to Spacecraft Systems
J.B. Heaney, Swales Aerospace, Beltsville, MD .....................................................................................................288
57 Advanced High Reflector Coatings for the Thirty Meter Telescope
W.D. Bennett and P.M. Martin, Pacific Northwest National Laboratory, Richland, WA; A. Phillips, W. Brown,
and V. Wallace, UCO Lick Observatory, Santa Cruz, CA; J. Stilburn, National Research Council of Canada,
Victoria, British Columbia, Canada; and J. Sebag, National Optical Astronomy Observatory, Tucson, AZ ............295
58 Comparison of Graded-index and Multilayer QW Stack Narrowband Optical Filters for Astronomy
M.-M. de Denus-Baillargeon* and L. Martinu, Département de génie physique, École Polytechnique de
Montréal, Montréal, Canada; and C. Carignan and O. Hernandez, Laboratoire d’astrophysique
expérimentale, Département de physique, Université de Montréal, Montréal, Canada .........................................299
59 A New Step Method for the Synthesis of Optical Filters with Arbitrary Indices
S. Larouche and L. Martinu, École Polytechnique de Montréal, Montréal, Canada ...............................................305
60 Diamond-like Carbon Depositions and Characterization
D.E. Morton and I. Stevenson, Denton Vacuum, Moorestown NJ; R. Vernhes, B. Baloukas, R. Snyders,
and J.E. Klemberg-Sapieha, École Polytechnique, Montréal, Canada; and S.J. Finke and J.E. Yehoda,
Morgan Advanced Ceramics, Inc., Diamonex Products Division, Allentown PA .....................................................309
61 Simultaneous Reflection and Transmission Measurements to Determine the Optical Constants of Thin
Films in the Extreme Ultraviolet
D.D. Allred, G.A. Acosta, N. Farnsworth-Brimhall, and R. S. Turley, Brigham Young University, Provo, UT ..........314
62 E-gun Sweep Design to Improve Silica Coating Performance: E-Gun Nonlinearity Investigation and
Silica Evaporation Modeling for Sweep Design
B. Xu and M. Gevelber, Boston University, Brookline, MA; D. Smith, Plymouth Grating Laboratory,
Plymouth, MA; G. Reimann, Cyber Materials LLC, Auburndale, MA; and J. Bellum, Sandia National
Laboratories, Albuquerque, NM .............................................................................................................................319
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Table of Contents
Plasma Processing
63 The High Power Impulse Magnetron Sputtering Discharge: The Ionization Mechanism
J.T. Gudmundsson, Science Institute and Department of Electrical and Computer Engineering,
University of Iceland, Reykjavik, Iceland ................................................................................................................329
64 Reactive Film Growth of TiN by Using High Power Impulse Magnetron Sputtering (HIPIMS)
J. Böhlmark, Chemfilt Ionsputtering AB, Linköping, Sweden and Plasma & Coatings Physics, IFM Material
Physics, Linköping University, Linköping, Sweden; M. Lattemann, Plasma & Coatings Physics, IFM
Material Physics, Linköping University, Linköping, Sweden; H. Stranning, Plasma & Coatings Physics,
IFM Material Physics, Linköping University, Linköping, Sweden and AB Sandvik Tooling, Stockholm,
Sweden; T. Selinder, AB Sandvik Tooling, Stockholm, Sweden; J. Carlsson, Chemfilt Ionsputtering AB,
Linköping, Sweden; and U. Helmersson, Plasma & Coatings Physics, IFM Material Physics, Linköping
University, Linköping, Sweden ...............................................................................................................................334
65 High-power Pulsed Sputtering with a Newly Designed Magnetron
J. Vlcek, P. Kudlacek, K. Burcalova, and J. Musil, Department of Physics, University of West Bohemia,
Plzen, Czech Republic ...........................................................................................................................................338
66 Deposition of High Conductivity ITO Films by High Power Pulsed Magnetron Sputtering (HPPMS)
V. Sittinger, F. Ruske, C. Gerloff, W. Werner, and B. Szyszka, Fraunhofer Institute for Surface Engineering
and Thin Films IST, Braunschweig, Germany; and D.J. Christie, Advanced Energy, Fort Collins, CO ..................343
67 Industrial-Scale Production of Corrosion-Resistant CrN/NbN Coatings Deposited by the Combined
High Power Impulse Magnetron Sputtering Etching Unbalanced Magnetron Sputtering Deposition
(HIPIMS/UBM) Process
A.P. Ehiasarian, C. Reinhard, and P.Eh. Hovsepian, Materials and Engineering Research Institute,
Sheffield Hallam University, Sheffield, United Kingdom; and J.M. Colton, Zachrome Works, Chesterfield,
United Kingdom ......................................................................................................................................................349
68 Low-Energy Ion-Beam Etching
J.R. Kahn and H.R. Kaufman, Kaufman & Robinson Inc., Fort Collins, CO ..........................................................354
69 Electric Fields and Plasma Excitation Around an RF Powered Electrode
E.V. Barnat and G.A. Hebner, Sandia National Laboratories, Albuquerque, NM ...................................................359
70 Surface Energy Enhancement, Plasma Chemical Vapor Deposition (PCVD), and Plasma Etching with
the One Atmosphere Uniform Glow Discharge Plasma (OAUGDP®)
J.R. Roth, T.A. Bonds, and S. Nourgostar, UT Plasma Sciences Laboratory, Department of Electrical and
Computer Engineering, University of Tennessee, Knoxville, TN ............................................................................363
71 Cleaning and Improving Adhesion of Surfaces by Their Treatment with Excited Atomic Oxygen
E.V. Shun’ko and V.S. Belkin, WINTEK Electro-Optics Corporation, Ann Arbor, MI ..............................................378
72 Atmospheric Plasma Treatment of Polyamide Films
D. Pappas, A. Bujanda, J.D. Demaree, J.K. Hirvonen, W. Kosik, R. Jensen. and S. McKnight, Army
Research Laboratory, Aberdeen Proving Ground, MD ...........................................................................................385
73 PECVD of SiO Films with Electron Beam Generated Plasmas
x
D. Leonhardt and S.G. Walton, US Naval Research Laboratory, Plasma Physics Division, Washington, DC .......389
74 Coating with Atmospheric Pressure Plasma Processes: From Large Area to µ-Structures
M. Thomas, M. Eichler, and C.-P. Klages, Fraunhofer Institute for Surface Engineering and Thin Films IST,
Braunschweig, Germany ........................................................................................................................................394
75 Sputtering of Polymers in Argon-Nitrogen Mixture
J. Kousal*, J. Hanus, A. Choukourov, H. Biederman, and D. Slavinska, Department of Macromolecular
Physics, Faculty of Mathematics and Physics, Charles University in Prague, Prague, Czech Republic ...............400
76 Diagnostics and Processing Applications of Electron Beam-Generated Plasmas Produced in Nitrogen
S.G. Walton, D. Leonhardt, and R.F. Fernsler, Plasma Physics Division, US Naval Research Laboratory,
Washington, DC .....................................................................................................................................................404
77 Smart Sputter and Etch Source Concepts for Low COO 300mm Wafer Processing
J. Weichart, Unaxis Balzers Aktiengesellschaft, Wafer Processing Division, Balzers, Principality of
Liechtenstein ..........................................................................................................................................................409
78 Sub Microsecond Resolved OES Investigations in a Pulsed Magnetron Discharge for Amorphous
Carbon Strain Gauge Thin Film Deposition
T. Wallendorf and S. Marke IfU Diagnostic Systems GmbH, Lichtenau, Germany; and R. Bandorf,
Fraunhofer Institut Schicht- und Oberflächentechnik, Braunschweig, Germany ....................................................413
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Process Control & Instrumentation
79 Robust Controller Tuning for Evaporative Deposition Processes: Results from Manufacturing Case
Studies
G. Reimann, B. Vattiat, and A. Brewster, Cyber Materials LLC, Auburndale, MA; M. Gevelber, Boston
University, Manufacturing Engineering, Brookline, MA; and J. Hildebrand and C. Hildebrand, Maxtek Inc.,
Cypress, CA ...........................................................................................................................................................421
80 Modeling of the Plasma Emission Redistribution Effect During Pulsed DC Magnetron Sputtering
G. Buyle and R. De Gryse, Ghent University, Ghent, Belgium; S. Shanmugamurthy, A. Belkind, and
K. Becker, Stevens Institute of Technology, Hoboken, NJ ......................................................................................428
81 A Second Hysteresis Effect of Reactive Magnetron Sputtering in Compound Mode
A. Pflug, M. Siemers, and B. Szyszka, Fraunhofer Institute for Surface Engineering and Thin Films IST,
Braunschweig, Germany; and D. Severin, I. Physikalisches Institut (1A), Aachen, Germany ...............................434
82 Radio Frequency Impedance Analysis of Silane Plasma for the Growth of Nanocrystalline Silicon Thin
Films
P.N. Dixit, S. Kumar, C.M.S. Rauthan, M. Dilshad, A. Bhardwaj, and S.S.Rajput, Plasma Processed
Materials Group, National Physical Laboratory, New Delhi, India ..........................................................................441
Smart Materials Symposium
83 Influence of the Nature of Electrodes on Lifetime of P3HT:PCBM Bulk Heterojunction Solar Cell
R. De Bettignies, J. Leroy, M. Firon, and C. Sentein, CEA Saclay, Gif-sur-Yvette, France ....................................447
84 Low Band Gap Polymers for Photovoltaic Devices
E. Bundgaard and F.C. Krebs, Risø National Laboratory, Roskilde, Denmark .......................................................453
85 Realization and Development of Extremely Thin Absorber Solid State Solar Cells (ETA)
M. Biancardo and F.C. Krebs, Risø National Laboratory, Danish Polymer Centre, Roskilde, Denmark ...............458
86 Sputter Deposition of High Quality Thermochromic VO Films for Smart Windows
2
Y. Shigesato and K. Kato, Graduate School of Science and Engineering, Aoyama Gakuin University,
Kanagawa, Japan ..................................................................................................................................................463
87 Multifunctional Carbon Nanotube Yarns and Textiles for Fun and Profit: Artificial Muscle, Electronic
Textile, Energy Storage and Harvesting, Display, Electron Emission, and Other Applications
R.H. Baughman, M. Zhang, S. Fang, A.A. Zakhidov, M. Kozlov, S.B. Lee, A.E. Aliev, and C.D. Williams,
NanoTech Institute, University of Texas at Dallas, Richardson, TX; and K.R. Atkinson, CSIRO Textile &
Fibre Technology, Belmont, Australia .....................................................................................................................466
88 ILGAR (Ion Layer Gas Reaction) – A Versatile Low-cost Method for the Deposition of High Quality Thin
Semiconductor and Insulator Layers
Ch.-H. Fischer, Hahn-Meitner-Institut Berlin, Berlin, Germany and Freie Universität Berlin,
Berlin, Germany; N. Allsop, Hahn-Meitner-Institut Berlin, Berlin, Germany; M. Bär, University
of Nevada, Las Vegas, NV; H.-J. Muffler, Energy Research Center of The Netherlands - ECN, ZG Petten,
The Netherlands, and M.C. Lux-Steiner, Hahn-Meitner-Institut Berlin, Berlin, Germany and Freie
Universität Berlin, Berlin, Germany ........................................................................................................................470
89 Influence of the D.C. Magnetron Sputter Deposition Process on the Photocatalytic Activity of
Amorphous TiO Thin Films
2
K. Eufinger, D. Poelman, H. Poelman, and R. De Gryse, Department of Solid State Sciences, Ghent,
Belgium; and G.B. Marin, Laboratorium voor Petrochemie Ghent University, Ghent, Belgium ..............................480
90 Efficient Plastic Solar Cells with Easy Solution Processing
G. Li, V. Shrotriya, J. Huang, Y. Yao, and Y. Yang, Department of Materials Science and Engineering,
University of California, Los Angeles, CA ...............................................................................................................485
91 Interaction Between Inorganic Compounds and Conjugated Polymers: Application as Hybrid Solar
Cells and Hybrid Solar Sensors
M. Lira-Cantu and J. Oró, Instituto de Ciencia de Materiales de Barcelona, Campus UAB, Barcelona, Spain;
and F.C. Krebs, Risø National Laboratory, The Danish Polymer Centre, Roskilde, Denmark ...............................491
92 Development of Evacuated Window – Vacuum Glazing
N. Ng and L. So, School of Physics A28, The University of Sydney, Sydney, Australia .........................................495
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Table of Contents
193 Smart Nano-Materials for Benign Indoor Environments
C.G. Granqvist, Department of Engineering Sciences, The Ångström Laboratory, Uppsala University,
Uppsala, Sweden; A. Azens, ChromoGenics Sweden AB, Uppsala, Sweden; P. Heszler, Research Group
of Laser Physics of the Hungarian Academy of Sciences, University of Szeged, Szeged, Hungary;
L.B. Kish, Department of Electrical Engineering, Texas A&M University, College Station, TX; and
L. Österlund, Department of Environment and Protection, FOI NBC Defence, Umeå, Sweden ...........................498
Tribological and Decorative Coating
194 Tribological Challenges For Plasma Surface Engineered Materials – A Personal View
P.A. Dearnley, School of Mechanical Engineering, University of Leeds, UK ..........................................................507
195 Comparison of Color Coatings on Stainless Steels Produced by Magnetron or Arc Deposition
M. Tobler and R. Bonetti, IonBond AG, Olten, Switzerland; I. Smith, IonBond, Mansfield, United Kingdom;
and P. Nagel and G. van der Kolk, IonBond NL BV, Venlo, The Netherlands ........................................................518
196 Adhesion of Galvanically Strengthened PVD Copper Metallization Films on ABS: A Model Study
C. Schrauwen, R. Tacken, V. Frencken, T. van Oudheusden, R. Renders, and K. Spee, TNO Science
and Industry, BU Materials Technology, Eindhoven, The Netherlands ...................................................................523
197 Carbon Based Coating Systems for Forming Tools
M. Weber, K. Bewilogua, I. Bialuch, M. Keunecke, H. Thomsen, and R. Wittorf, Fraunhofer Institute for
Surface Engineering and Thin Films, Braunschweig, Germany .............................................................................529
198 An Adherent Nano-superhard TiN Film Synthesized by a Vacuum Cathode Multi-arc Ion-plated System
X. Yu, China University of Geosciences, Beijing, People's Republic of China; Y. Liu, Beijing Powertech
Co. Ltd., Beijing, People's Republic of China; C.B. Wang, China University of Geosciences, Beijing,
People's Republic of China; and D.Y. Yu, Beijing Powertech Co. Ltd., Beijing, People's Republic of China .........538
199 Tribological Studies of Titanium Nitride Coatings Deposited by Pulsed Magnetron Sputtering
P.J. Kelly, Surface Engineering Group, Manchester Metropolitan University, Manchester, United Kingdom;
Z. Liu, Institute for Materials Research, University of Salford, Salford, United Kingdom; and R.D. Arnell,
Jost Institute for Tribotechnology, University of Central Lancashire, Preston, United Kingdom .............................544
100 Properties of Magnetron Sputtered Hard Coatings on Carbon and Glass Fibre Composites
T. Kääriäinen, M. Rahamathunnisa, M. Tanttari, and D.C. Cameron, ASTRaL, Lappeenranta University of
Technology, Mikkeli, Finland ...................................................................................................................................548
101 Microtribology: Carbon Based Coatings on Micro Structured Surfaces
R. Bandorf, H. Lüthje, R. Küster, and J.-H. Sick, Fraunhofer Institute for Surface Engineering and Thin
Films IST, Braunschweig, Germany .......................................................................................................................554
102 Intensive Color Coatings Deposited by Magnetron Sputtering
Y. Yamazaki, M. Thompson, and H. Richter, Jr., Richter Precision, Inc., East Petersburg, PA; S. Kunkel
and W.D. Münz, SVS Vacuum Coatings Technologies, Karlstadt, Germany ........................................................558
103 The Micro-Drilling and Turning Performance of TiNW Coatings Deposited by Magnetron Sputtering
2 y x
T.H. Liu and Y.L. Su, National Cheng Kung University, Tainan, Taiwan; C.T. Su, National Koahsiung First
University of Science and Technology, Koahsiung, Taiwan; and S.H. Yao, Chang Jung Christian University,
Tainan, Taiwan ........................................................................................................................................................563
104 Silicon Dioxide Coatings on Plastic Substrates by a Large Area Plasma Enhanced Chemical Vapor
Deposition Process
J. Madocks, P. Marcus, and P. Morse, General Plasma, Inc., Tucson, AZ .............................................................569
105 Structure Evolution of Cr-Al-N Hard Coatings
P.H. Mayrhofer, Physical Metallurgy and Materials Testing, Montanuniversität Leoben, Leoben, Austria,
and Thin Film Division, Department of Physics (IFM), Linköping University, Linköping, Sweden;
H. Willmann, Thin Film Division, Department of Physics (IFM), Linköping University, Linköping, Sweden,
and Materials Center Leoben, Leoben, Austria; and A.E. Reiter, Balzers Ltd., Liechtenstein, Austria ...................575
106 Improving the Performance of Rolling Element Bearings with Nanocomposite Tribological Coatings
G.L. Doll, The Timken Company, Canton, OH .......................................................................................................580
107 Tribological Properties of CrN/Wx Nanolayered Coatings Deposited by Magnetron Sputtering
T.H. Liu and Y.L. Su, Department of Mechanical Engineering, National Cheng Kung University, Tainan,
Taiwan ....................................................................................................................................................................589
108 PVD Coatings on Plastic Substrates
P. Peeters, M. Eerden, J. Landsbergen, R. Tietema, and T. Krug, Hauzer Techno Coating, Venlo,
The Netherlands .....................................................................................................................................................595
ix