SVC - 45th Annual Technical Conference Proceedings

12 Pages·2002·0.058 MB·English

45th Annual
Technical Conference
Proceedings
April 13–18, 2002
Lake Buena Vista, Florida
Copyright © 2002 by Society of Vacuum Coaters
71 Pinon Hill Place NE • Albuquerque, NM 87122-1914 USA
Telephone [phone] • Fax [phone]
E-mail [email protected]
Web Site www.svc.org
Executive Director: Vivienne Harwood Mattox
Technical Director: Donald M. Mattox
Annual Technical
Conference Proceedings
Prior Proceedings available in print:
19th Annual Technical Conference Proceedings (1976) ISBN 1-878068-00-8
20th Annual Technical Conference Proceedings (1977) ISBN 1-878068-01-6
21st Annual Technical Conference Proceedings (1978) ISBN 1-878068-02-4
22nd Annual Technical Conference Proceedings (1979) ISBN 1-878068-03-2
24th Annual Technical Conference Proceedings (1981) ISBN 1-878068-04-0
28th Annual Technical Conference Proceedings (1985) ISBN 1-878068-05-9
30th Annual Technical Conference Proceedings (1987) ISBN 1-878068-06-7
31st Annual Technical Conference Proceedings (1988) ISBN 1-878068-07-5
32nd Annual Technical Conference Proceedings (1989) ISBN 1-878068-08-3
33rd Annual Technical Conference Proceedings (1990) ISBN 1-878068-09-1
34th Annual Technical Conference Proceedings (1991) ISBN 1-878068-10-5
35th Annual Technical Conference Proceedings (1992) ISBN 1-878068-11-3
36th Annual Technical Conference Proceedings (1993) ISBN 1-878068-12-1
37th Annual Technical Conference Proceedings (1994) ISBN 1-878068-13-X
38th Annual Technical Conference Proceedings (1995) ISSN 0737-5921
39th Annual Technical Conference Proceedings (1996) ISSN 0737-5921
40th Annual Technical Conference Proceedings (1997) ISSN 0737-5921
41st Annual Technical Conference Proceedings (1998) ISSN 0737-5921
42nd Annual Technical Conference Proceedings (1999) ISSN 0737-5921
43rd Annual Technical Conference Proceedings (2000) ISSN 0737-5921
44th Annual Technical Conference Proceedings (2001) ISSN 0737-5921
Proceedings available on CD-ROM:
The SVC Technical Conference Proceedings CD-ROM is an annually updated reference containing conference
manuscripts from 1991 to the present and abstracts and paper summaries from 1957 to the present. Each year’s
edition contains all the information from earlier editions.
Notice: The manuscripts in the SVC Conference Proceedings have not been peer reviewed. SVC assumes no
responsibility for the content.
Copyright © 2002 by Society of Vacuum Coaters
All rights reserved. No part of this book may be used or reproduced in any manner without written permission
except in the case of brief quotations embodied in critical articles and reviews. For information, contact the
publisher.
Society of Vacuum Coaters
45th Annual Technical Conference Proceedings
Published by:
Society of Vacuum Coaters
71 Pinon Hill Place NE
Albuquerque, NM 87122-1914 USA
Telephone [phone]
Fax [phone]
E-mail [email protected]
Web Site www.svc.org
ISSN 0737-5921
Printed in the United States of America
ii
2002 Conference
Program Committee
Conference Program Chairs
Peter Martin, Battelle Pacific Northwest Laboratory
Ric Shimshock, MLD Technologies LLC
Director of TACs
Clark Bright, 3M Company
Optical Coating Committee Chair
Ludvik Martinu, École Polytechnique
Vacuum Web Coating Committee Chairs
Roger S.A. Kelly, Rexam Metallising Limited
Peter J. Moulds, Tekra Advanced Technologies Group
Decorative & Functional Coating Committee Chairs
Ton Hurkmans, Hauzer Techno Coating USA
Dale McIntyre, Vapor Technologies, Inc.
Large Area Coating Committee Chair
Michael Andreasen, Guardian Industries Coporation
Emerging Technologies Committee Chairs
Hana Baránková, Uppsala University, Sweden
Ladislav Bárdos, Uppsala University, Sweden
Process Control & Instrumentation Committee Chairs
J. Grant Armstrong, Carberry Technologies
David Chamberlain, MKS Instruments, Inc.
Plasma Processing Committee Chairs
Ric Shimshock, MLD Technologies, LLC
Falke Milde, Von Ardenne Anlagentechnik GmbH
Vasgen Shamamian, Naval Research Laboratory
Tribological & Wear Coating Committee Chairs
Allan Matthews, Hull University
Gary Doll, Timken Research
Vendor Session Committee Chair
Frank T. Zimone, Denton Vacuum, LLC
Education Committee Chair
H. Angus Macleod, Thin Film Center, Inc.
Equipment Exhibit Committee Chair
Michael LaFrance, Vaporfaze
“Meet the Experts” Corner
Donald M. Mattox, SVC Technical Director
Conference Administrator
Vivienne Harwood Mattox, SVC Executive Director
x
Table of Contents
Plenary Session
11 Patents in the 21st Century
R.A. Killworth, Killworth, Gottman, Hagan & Schaeff L.L.P., Dayton, Ohio................................................................3
Process Control & Instrumentation
12 Multi-Level Control for Reactive Sputtering
W.D. Sproul and B.E. Sylvia, Reactive Sputtering, Inc., Goleta, CA .......................................................................11
13 Simulation of Reactive Magnetron Sputtering Kinetics in Real In-Line Processing Chambers
A. Pflug, N. Malkomes, V. Sittinger, and B. Szyszka, Fraunhofer Institute for Thin Films and Surface
Engineering (IST), Braunschweig, Germany...........................................................................................................16
14 Controlled Reactive Sputter Deposition in DC Mode: an Alternative for Switching
A. Blondeel, Bekaert VDS, Belgium; and W. De Bosscher, Sinvaco, Belgium........................................................22
15 Reactively Sputtering High on the Transition Curve Using a Few Inexpensive Components
J. German, Sage Electrochromics, Faribault, MN; and D. Pelleymounter, Advanced Energy, Northfield, MN........27
16 Arc Discharges in the Reactive Sputtering of Electrical Insulating Compounds
A. Segers, Bekaert N.V., Zwevegem, Belgium; and D. Depla, K. Eufinger, J. Haemers, and R. De Gryse, State
University of Ghent, Ghent, Belgium .......................................................................................................................30
17 Temperature Control of Glass Substrates in an Ion-Beam-Assisted Sputtering Deposition System
D. Deakins, I. Kameyama, B. Buchholtz, and R. Blacker, Veeco-Ion Tech, Inc., Fort Collins, CO ..........................36
18 Comparison of Different Concepts for the Stabilization of Reactive Sputtering Processes
N. Malkomes, A. Pflug, B. Szyszka, and M. Vergöhl, Fraunhofer Institute for Thin Films and Surface
Engineering (IST), Braunschweig, Germany...........................................................................................................41
Decorative & Functional Coating
19 Advanced Application Tailored PVD Coatings Utilizing Nanoscale Multilayer/Superlattice
Structures
P.Eh. Hovsepian, Sheffield Hallam University, Sheffield, UK; and W.-D. Münz, Bodycote SHU Coatings Ltd.
and Sheffield Hallam University, Sheffield, UK........................................................................................................49
10 Color Measurement for Decorative Coatings on Three-Dimensional Parts
P. Sullivan, Vapor Technologies, Longmont, CO; M. Mann and L. Wilburn, Delta Faucet Company,
Chickasha, OK; and G. DeVries, Delta Faucet Company, Greensburg, IN.............................................................56
11 Nanolayered Hard Coatings for High-Temperature Applications
S.A. Barnett and K. Martin, Northwestern University and Functional Coating Technology, Evanston, IL;
A. Madan, Northwestern University, Evanston, IL; J. Ji and I. Kim, Functional Coating Technology,
Evanston, IL; and A. Inspekton, Kenymetal, Latrobe, PA........................................................................................59
12 New Ultrasonic Technology Improves Cleaning and Prevents Surface Damage Due to Cavitation
Erosion Effects
F.J. Fuchs, Blackstone-Ney Ultrasonics, Jamestown, NY .......................................................................................64
13 Pre PVD Cleaning
K. Brondum, E. Sprague, J. Hutchinson, and G. Pargas, Vapor Technologies Inc., Longmont, CO .......................68
14 Multistage Ultrasonic Cleaning for Industrial PVD Applications
M. Ertl, ECE, Bensheim, Germany; and R. Hohl, UCM, St. Margrethen, Switzerland.............................................74
15 Chromium Reduction in Gas Turbine Engines
L.O. Cato, Concurrent Technologies Corporation, Edgefield, SC; and M.L. Klingenberg, Concurrent
Technologies Corporation, Johnstown, PA ..............................................................................................................78
Emerging Technologies
16 ElectroSpark Deposition: Principles and Applications
R.N. Johnson, Pacific Northwest National Laboratory, Richland, WA .....................................................................87
17 Silica-Based Oxygen Barrier Coatings onto PET Films via Combustion Chemical Vapor Deposition
G.N. Deshpande, M.B. Jones, and A.T. Hunt, MicroCoating Technologies, Inc., Atlanta, GA .................................93
iii
Table of Contents
18 High Deposition Rate Reactive Sputtering with Hollow Cathode
A.A. Pradhan and S.I. Shah, University of Delaware, Newark, DE .........................................................................96
19 Thick Film Substrate Heaters for CVD and PVD Applications
S. Johnson and C. Hagen, Motorola Labs, Tempe, AZ..........................................................................................101
20 Advanced Plasma Processing by 2.45 GHz SLAN Microwave and 13.56 MHz Hollow Cathode
Plasma Sources
A. Schwabedissen and J. Engemann, Forschungszentrum für Mikrostrukturtechnik – fmt,
University of Wuppertal, Wuppertal, Germany.......................................................................................................103
21 Hollow Cathode Plasma Cleaning and Surface Activation
H. Baránková and L. Bárdos, Uppsala University, Uppsala, Sweden....................................................................109
22 Reactive Sputtering from a Dual Rotatable Cathode for SiO, SiN and SiON Coatings onto
2 3 4 x y
Flexible Substrates
A.W. Smith, N.G. Butcher, and D. Walker, Valmet General, Heywood, United Kingdom.......................................113
23 LiPO:N/LiCoO Coatings for Thin Film Batteries
3 4 2
M.E. Gross, P.M. Martin, D.C. Stewart, J.W. Johnston, C.F. Windisch, and G.L. Graff,
Pacific Northwest National Laboratory, Richland, WA; and P.L. Rissmiller and E.L. Dudeck,
Mine Safety Appliances Company, Sparks, MD.....................................................................................................119
Large Area Coating
25 Large Area Ion-Beam Deposition of Hydrogenated Tetrahedral Amorphous Carbon on Soda-Lime
Glass
V.S. Veerasamy, R.H. Petrmichl, H.A. Luten, and S.V. Thomsen, Guardian Industries Corporation,
Science and Technology Center, Carleton, MI.......................................................................................................127
26 Uniformity Control in Sputter Deposition Processes
W. De Bosscher, Bekaert Advanced Coatings, Deinze, Belgium; A. Blondeel, Bekaert VDS, Deinze, Belgium;
and G. Buyle, State University of Ghent, Ghent, Belgium.....................................................................................135
27 High Rate Deposition from Ceramic Targets of Titania-Based Low-Emissivity Coatings
P. Greene, J. Rietzel, and S. Nadel, Von Ardenne Coating Technology, Fairfield CA............................................142
28 Process Control Requirements for Uniform Large Area Coatings
L. Anderson, T. Rettich, and P. Wiedemuth, Hüttinger Elektronik GmbH + Co. KG, Freiburg, Germany...............148
29 Process Development for Large Area Reactive Magnetron Sputtering
C. May, F. Milde, and G. Teschner, Von Ardenne Anlagentechnik GmbH, Dresden, Germany .............................153
30 Fast Process Setup Times for Sputtered Dielectric Beam Splitters with TiO and SiO Layers Using
2 2
Computer-Aided Recalculation
H.G. Lotz, J. Trube, and A. Zmelty, Applied Films GmbH & Co. KG, Alzenau, Germany ......................................159
31 Assessment of Attitudes and Expectations of Switchable Glass Among United States Window
Manufacturers
G.M. Sottile, Townsend Research Group LLC, Hartland, CT.................................................................................163
32 Plasma Simulation for Planar Sputtering Cathodes
A. Lopp, C. Braatz, M. Geisler, H. Claus, and J. Trube, Applied Films GmbH & Co. KG, Alzenau, Germany.......170
33 Improving the Adhesion of Siloxane-Based Plasma Coatings on Polymers with Defined Wetting
Properties
D. Hegemann, H. Brunner, and C. Oehr, Fraunhofer Institute for Interfacial Engineering and Biotechnology
(IGB), Stuttgart, Germany......................................................................................................................................174
34 Investigation of Al-Si Compositions for Thin Film Applications
G.M. Wityak, Academy Precision Materials, Division of Academy Corporation, Albuquerque, NM.......................179
35 Biased Dual Magnetron Sputter Deposition of Alumina
A. Belkind, Abe Belkind & Associates, North Plainfield, NJ; W. Song, Stevens Institute of Technology,
Hoboken, NJ; and G. McDonough and R. Scholl, Advanced Energy Industries, Fort Collins, CO........................184
36 Large Area Dielectric Coating of Silicon Dioxide on Steel by Reactive EB-PVD
E. Reinhold, H. Hummel, J. Richter, and U. Seyfert, Von Ardenne Anlagentechnik GmbH, Dresden, Germany ..190
iv
Table of Contents
37 Energetic Substrate Bombardment in Reactive Sputtering with Flange-Mounted Magnetrons in
Different Pulse Modes
H. Bartzsch, P. Frach, K. Goedicke, and Chr. Gottfried, Fraunhofer-Institut für Elektronenstrahl-und
Plasmatechnik (FEP), Dresden, Germany.............................................................................................................196
38 Novel Magnetic Plasma Confinement Method for Plasma Treatment and PECVD Processes
J. Madocks, Applied Process Technologies, Inc., Tucson, AZ...............................................................................202
Optical Coating
39 Advanced Automotive Glazings: a Cool Idea for Hot Cars
R.B. Farrington, National Renewable Energy Laboratory, Golden, CO.................................................................209
40 Toward the Manufacture of “Perfect” Antireflection Coatings
P. Ma, J.A. Dobrowolski, D. Poitras, T. Cassidy, and F. Lin, Institute of Microstructural Sciences,
National Research Council of Canada, Ottawa, Canada.......................................................................................216
41 Annealing Effects on the Properties of Optical Filters
S.M. Lee, A. Dummer, and C. Montcalm, Veeco-Ion Tech, Inc., Fort Collins, CO; and S. Kohli, Colorado
State University, Fort Collins, CO ..........................................................................................................................220
42 Optical and Electrical Impedance Spectroscopy Studies of Protein-Lipid Bilayer Systems on a
Thin Film Coupled Plasmon-Waveguide Resonator
Z. Salamon and G. Tollin, University of Arizona, Tucson, AZ; and I. Stevenson and D. Morton,
Denton Vacuum, LLC, Moorestown, NJ.................................................................................................................224
43 Ultra-Low Anti-Reflection (AR) Coating for High-Power External Cavity Diode Lasers (ECLs)
L. Huang, G. Zhang, and W. Tang, New Focus, Inc., San Jose, CA......................................................................228
44 Design and Characterization of Ion Beam Deposited Gain Flattening Filters
R. Blacker, D. Deakins, I. Kameyama, A. Dummer, B. Buchholtz, D. Siegfried, and C. Montcalm,
Veeco-Ion Tech, Inc., Fort Collins, CO...................................................................................................................232
45 Fabrication and Optical Behavior of Chiral Thin Film Materials
M.J. Brett, M.O. Jensen, J.C. Sit, S.R. Kennedy, and K.D. Harris, University of Alberta, Edmonton, Canada;
and D.J. Broer, Philips Research Laboratories, Eindhoven, The Netherlands ......................................................238
46 High-Rate Dual Ion Beam Sputtering Deposition Technology for Optical Telecommunication Filters
C. Montcalm, S.M. Lee, D. Burtner, A. Dummer, D. Siegfried, I. Wagner, and M. Watanabe, Veeco
Instruments Inc., Fort Collins, CO..........................................................................................................................245
47 In Situ Ellipsometric Study of the Initial Growth Stages of a-TiO by PECVD
2
A. Amassian*, S. Larouche, J.E. Klemberg-Sapieha, P. Desjardins, and L. Martinu, École Polytechnique,
Montréal, Canada..................................................................................................................................................250
48 Influences of the Substrate and Deposition Process on the Accuracy of Optical Monitoring
D. Deakins and R. Ferguson, Veeco-Ion Tech, Inc., Fort Collins, CO ...................................................................256
49 The Use of Etching During the Precise Manufacture of Optical Multilayer Coatings
D. Poitras, T. Cassidy, S. Moisa, and J.A. Dobrowolski, Institute for Microstructural Sciences, National
Research Council of Canada, Ottawa, Canada.....................................................................................................262
50 Characterization of Thin Metal Films of Niobium and Zirconium
F. Placido and A. Voronov, University of Paisley, Paisley, United Kingdom...........................................................266
51 Optical Thin Film Deposition by Filtered Cathodic Arc Techniques
P.J. Martin and A. Bendavid, CSIRO Telecommunications and Industrial Physics, Lindfield, Australia.................270
52 Low-Cost High-Performance Transparent Conducting Oxide Films Fabricated by Combustion
Chemical Vapor Deposition
Z. Zhao, M. Vinson, J. McEntyre, F. Fortunato, and A.T. Hunt, MicroCoating Technologies, Inc., Atlanta, GA......274
53 SiO – SiN Functional Coatings by PECVD of Organosilicon Monomers Other Than Silane
x x
F. Benítez* and J. Esteve, Universitat de Barcelona, Barcelona, Spain; and M. Galan, Telstar Industrial,
Terrassa, Spain......................................................................................................................................................280
54 Effects of Increasing Nitrogen on Amorphous TiON Thin Films
x y
K. Hukari, AFG Development Center, Petaluma, CA; R. Dannenberg, Chahaya Optronics, Fremont, CA;
and E.A. Stach, Lawrence Berkeley National Laboratory, Berkeley, CA ...............................................................286
v
Table of Contents
55 Broad Band Antireflection Coating on Zinc Selenide from 2 to 12 m m Wavelength Region
A. Ghosh, P. Kant, P. Chandra, and P.K. Bandyopadhyay, Instruments Research and Development
Establishment, Dehra Dun, India...........................................................................................................................292
56 Application of a Refined Error Model of Turning Point Monitoring to the Simulation of Narrow
Bandpass Filter Production
R.R. Willey, Willey Optical, Consultants, Charlevoix-the-Beautiful, MI..................................................................295
57 Optical Monitoring of Thin Films Using Spectroscopic Ellipsometry
D.E. Morton, Denton Vacuum, LLC, Moorestown, NJ; and B. Johs and J. Hale, J.A. Woollam Co., Inc.,
Lincoln, NE.............................................................................................................................................................299
58 Substrate Response During Dual Bipolar Pulsed Magnetron Sputtering
J. O’Brien and P.J. Kelly, University of Salford, Salford, United Kingdom; J.W. Bradley, UMIST,
Manchester, United Kingdom; R. Hall, Advanced Energy Industries UK Ltd., Bicester, United Kingdom;
and R.D. Arnell, University of Salford, Salford, United Kingdom ...........................................................................306
Plasma Processing
59 Pulse Magnetron Sputtering—Development and Application Trends
T. Winkler, Fraunhofer Institut Elektronenstrahl-und Plasmatechnik (FEP), Dresden, Germany...........................315
60 Study of the Reactivity of Tin and Titanium During the Synthesis of SnO and TiO Thin Films by
x x
DC Magnetron Reactive Sputtering
R. Snyders*, M. Wautelet, R. Gouttebaron, J.P. Dauchot, and M. Hecq, Mons-Hainaut University,
Mons, Belgium.......................................................................................................................................................323
61 CrN Deposition by Reactive High-Power Density Pulsed Magnetron Sputtering
A.P. Ehiasarian and W.-D. Münz, Sheffield-Hallam University, Sheffield, United Kingdom; and L. Hultman
and U. Helmersson, Linköping University, Linköping, Sweden..............................................................................328
62 Optical Emission Studies for the Characterization of Pulsed Magnetron Sputtering Systems
M. Cornett and M. George, Deposition Sciences, Inc., Santa Rosa, CA; B. Fries and H. Walde,
Advanced Energy Industries, Fort Collins, CO; and L. Casson and R. Pini, Jobin Yvon, Inc., Edison, NJ............335
63 Magnetron Sputtering Deposition of Titanium Nitride Films Using Optical Emission Spectroscopy
(OES) as In-Situ Technique for Plasma Diagnostics
C. Goyes, F. Sequeda, and A. Neira*, Universidad del Valle, Santiago de Cali, Colombia ...................................341
64 Influence of Recapture of Secondary Electrons on the Magnetron Sputtering Deposition Process
G. Buyle*, D. Depla, K. Eufinger, J. Haemers, and R. De Gryse, State University of Ghent, Ghent, Belgium;
and W. De Bosscher, Bekaert Advanced Coatings (Bekaert VDS), Deinze, Belgium ...........................................348
65 Plasma Processing System Based on Electron Beam Ionization
D. Leonhardt, M.M. Balkey, R.F. Fernsler, R.A. Meger, and D.P. Murphy, Naval Research Laboratory,
Plasma Physics Division, Washington, DC; and S.G. Walton and D.D. Blackwell, SFA, Inc., Largo, MD.............354
66 Ion Plating and Beyond: Pushing the Limits of Energetic Deposition
A. Anders, Lawrence Berkeley National Laboratory, Berkeley, CA........................................................................360
67 Modification of Polyolefins in Nitrogen Atmospheric Pressure Glow Discharges: Surface
Degradation and Hydrophobic Recovery
S. Guimond* and I. Radu, École Polytechnique, Montréal, Canada; G. Czeremuszkin, Nova-Plasma Inc.,
Montréal, Canada; and M.R. Wertheimer, École Polytechnique, Montréal, Canada.............................................366
68 Parallel Plate RF Plasma Deposition of Si/C Films Using Tetraalkylsilanes as Precursor
Compounds
C. Rapiejko*, R. Mazurczyk, and M. Gazicki-Lipman, Technical University of Lodz, Lodz, Poland;
and A. Werbowy, Warsaw University of Technology, Warsaw, Poland...................................................................372
69 Ion Flux Measurements in Electron Beam-Generated Plasmas
S.G. Walton, SFA, Inc., Largo, MD; D. Leonhardt, R.F. Fernsler, and R.A. Meger, Naval Research
Laboratory, Washington, DC..................................................................................................................................378
70 Understanding Chemical Decomposition Pathways of Organic Molecules in Low Density
Discharges as a Prelude to Plasma Functionalization of Surfaces
D.C. Guerin and V.A. Shamamian, Naval Research Laboratory, Washington, DC................................................384
vi
Table of Contents
Tribological & Wear Coating
71 Tribological Testing of PVD Coatings for Mechanical Components
S. Jacobson and S. Hogmark, The Ångström Laboratory, Uppsala University, Uppsala, Sweden........................393
72 High-Density Pulsed Plasmas for the Deposition of Hard Coatings on Three-Dimensional
Substrates
H. Klostermann, F. Fietzke, O. Zywitzki, and K. Goedicke, Fraunhofer-Institut für Elektronenstrahl-und
Plasmatechnik (FEP), Dresden, Germany.............................................................................................................402
73 Decorative and Functional TiN Coatings for Aluminum Bicycle Parts
B.R. Anton, Vapor Technologies Inc., Longmont, CO; and P.C. Esquibel, RockShox Inc.,
Colorado Springs, CO............................................................................................................................................407
74 Development and Production of IBED CrN
2
S.L. Ream, A.H. Deutchman, and R.J. Partyka, Worthington BeamAlloy, Dublin, OH..........................................412
75 Optical, Chemical, Structural, and Mechanical Properties of CrBN Coatings
S.M. Aouadi, T.Z. Gorishnyy, S. Varma, and S.L. Rohde, University of Nebraska, Lincoln, NE ............................417
Vacuum Web Coating
76 Polymer Film Deposition by a New Vacuum Process
J. Affinito, Sion Power Corporation, Tucson, AZ....................................................................................................425
77 Deposition of Titanium Dioxide by High-Rate, Ion-Assisted Electron Beam Evaporation
N. Schiller, M. Krug, S. Straach, and M. Neumann, Fraunhofer-Institute Elektronenstrahl-und Plasmatechnik
(FEP), Dresden, Germany.....................................................................................................................................440
78 Cluster Layers for Surface Enhanced Absorption (SEA)
H. Walter, G. Bauer, R. Domnick, and J. Hassmann, november AG, Erlangen, Germany....................................443
79 The Stabilization of Reactive DC- and MF-Sputter Processes with Oxygen Partial Pressure
Measurement
P. Sauer, J. Bruch, R. Kukla, H.-G. Lotz, J. Trube, and T. Willms, Applied Films GmbH & Co. KG, Alzenau,
Germany................................................................................................................................................................446
80 High-Rate PECVD on Web Accomplished with New Magnetically Enhanced Source
J. Madocks, Applied Process Technologies, Inc., Tucson, AZ...............................................................................451
81 Calibration of an XRF Spectrometer for Thickness Determination of Ultra Thin Metal Layers on
Polymers by RBS
S. Zoister, R. Einsiedler, F. Kastner, and M. Bergsmann, Hueck Folien GmbH, Baumgartenberg, Austria;
and M. Draxler and P. Bauer, Universität Linz, Linz, Austria..................................................................................457
82 Future Trends in Permeation Measurement
R.D. Maixner, MOCON Inc., Minneapolis, MN.......................................................................................................461
83 Growth Modes of SiO Films on Polymeric Substrates
2
G. Dennler* and M.R. Wertheimer, École Polytechnique, Montréal, Canada; A. Houdayer,
Université de Montréal, Montréal, Canada; and P. Raynaud, I. Séguy, and Y. Ségui, Université Paul
Sabatier, Toulouse, France....................................................................................................................................465
84 Ultra High Barrier Layers for Technical Applications
H.-C. Langowski, A. Melzer, and D. Schubert, Fraunhofer Alliance Polymer Surfaces, Freising, Germany..........471
85 Polymer Web Surface Cleanliness
C.A. Bishop, C.A. Bishop Consulting Ltd., Newby, Middlesbrough, N. Yorks, United Kingdom.............................476
86 New Developments in Polyester Films for Display Applications
W.A. MacDonald, J.M. Mace, and N.P. Polack, DuPont Teijin Films (UK) Limited, Middlesbrough,
United Kingdom.....................................................................................................................................................482
87 Deposition Technology of Transparent Conductive Coatings on PET Foils
M. Fahland, C. Charton, and A. Klein, Fraunhofer Institute for Electron Beam and Plasma Technology,
Dresden, Germany ................................................................................................................................................487
88 Basic Principles of Thin Film Barrier Coatings
W. Decker, Toray Plastics (America), Inc., North Kingstown, RI; and B. Henry, University of Oxford,
Oxford, United Kingdom ........................................................................................................................................492
vii
Table of Contents
89 Factors Affecting Water Vapor Permeation Through PET/AlON Films
x y
A.G. Erlat, B.M. Henry, C.R.M. Grovenor, and G.A.D. Briggs, University of Oxford, Oxford, United Kingdom;
and Y. Tsukahara, Toppan Printing Co., Ltd., Saitama, Japan...............................................................................503
90 Process Control and Defects Monitoring in Vacuum Web Coating
A. Fusi and F. Rimediotti, Galileo Vacuum Systems, Prato, Italy...........................................................................509
91 Gas Permeation Studies of Metal Oxide/Polymer Composite Films
B.M. Henry, A.G. Erlat, C.R.M. Grovenor, and G.A.D. Briggs, University of Oxford, Oxford, United Kingdom;
and T. Miyamoto and Y. Tsukahara, Toppan Printing Co., Ltd., Saitama, Japan....................................................514
92 Layer Defects and the Synergetic Effect Between Inorganic and Organic Barrier Layers
M. Hanika, Technical University of Munich, Garching, Germany; and H.-C. Langowski and U. Moosheimer,
Fraunhofer-Institute for Process Engineering and Packaging, Freising, Germany................................................519
93 PECVD of SiOx Barrier Films
A.W. Smith, N. Copeland, D. Gerrerd, and D. Nicholas, Valmet General, Ltd., Heywood, United Kingdom .........525
94 Self-Healing Flexible Photonic Composites for Light Sources
M.G. Mikhael and A. Yializis, Sigma Technologies International Inc., Tucson, AZ.................................................530
95 Web Coating with Lithium—Technical Solution for Metal Anode Structures in Li Batteries
R. Swisher, Sheldahl, Inc., Northfield, MN; and E. Yadin and G. Pipkevich, Sidrabe, Inc., Riga, Latvia...............535
96 Pigments Exhibiting Diffractive Effects
A. Argoitia and M. Witzman, Flex Products Inc., Santa Rosa, CA.........................................................................539
97 A New Method for Measuring Low Levels of Water Vapor Permeation Through Polymers and
Permeation Barrier Coatings
H. Nörenberg, G.D.W. Smith, and G.A.D. Briggs, University of Oxford, Oxford, United Kingdom; and
T. Miyamoto and Y. Tsukahara, Technical Research Institute, Toppan Printing Company, Saitama, Japan..........546
Technical Poster Presentations
98 History of Mechanical Vacuum Pumps in the United States
D.B Webb, Vacua Techniques Company, Alamo, CA ............................................................................................551
99 Comparison of SiON Thin Films Deposited by ECR-PECVD at 2.4 and 3.0 mTorr Total Pressure
x y
J. Wojcik and L. Chan, McMaster University, Hamilton, Ontario, Canada; W.N. Lennard, The University
of Western Ontario, London, Ontario, Canada; and J.A. Davies and P. Mascher, McMaster University,
Hamilton, Ontario, Canada ....................................................................................................................................558
100 Plasma-Enhanced CVD Deposited Diamond-Like Carbon Films for High-Density Magnetic
Recording
D. Ochs, M. Geisler, and B. Cord, Unaxis, Alzenau, Germany..............................................................................561
101 Gas Barrier Silica Films Deposited on Polyethyleneterephtalate by Low-Temperature Plasma-
Enhanced CVD Using Organosilane Sources
K. Teshima, Nagoya University, Nagoya, Japan and Dai Nippon Printing, Kashiwa, Japan; and Y. Inoue,
H. Sugimura, and O. Takai, Nagoya University, Nagoya, Japan............................................................................565
102 Parameter Optimization in Pulsed DC Reactive Sputter Deposition of Aluminum Oxide
D. Carter, H. Walde, G. McDonough, and G. Roche, Advanced Energy Industries, Fort Collins, CO...................570
103 Flexible a-Si:H Electrophotographic Photoreceptors
M.D. Graham, Beckman Coulter, Inc., Nicholasville, KY.......................................................................................578
104 Automated Vacuum Equipment for Deposition of Anti-Reflection Coatings on CRTs
U. Shyrypau, A. Khakhlou, M. Leuchuk, and S. Maryshev, IZOVAC Ltd., Minsk, Belarus.....................................587
105 Deposition and Characterization of Perovskite Pb La(Zr,Ti)O (PLZT) Thin Films by Combustion
1-x x 3
Chemical Vapor Deposition (CCVD)
Y.D. Jiang, T.J. Metzger, X. Xu, T.A. Polley, and A.T. Hunt, MicroCoating Technologies, Inc., Atlanta, GA...........592
106 A Direct Method for Determining Thickness and Optical Constants of Thin Films
D. Pekker, Rice University, Houston, TX; and L. Pekker, Deposition Sciences, Inc., Santa Rosa, CA .................599
107 Transparent, Conductive ITO for Telecommunication Wavelengths
A. Voronov and F. Placido, Thin Film Centre, University of Paisley, Paisley, United Kingdom..............................603
viii
108 Influence of Substrate Temperature and Bias Voltage on the Optical Properties of Sputter Coated
TiN Films
H.Z. Durusoy and Ö. Duyar, Hacettepe University, Ankara, Turkey; and A. Aydinli and F. Ay,
Bilkent University, Bilkent, Ankara, Turkey.............................................................................................................607
109 Plasma-Assisted Deposition of Precision Optical Coatings over Extended Areas
D.R. Gibson, Satis Vacuum Industries Vertriebs AG, Baar, Switzerland; and C. Huiguang,
Zhejiang Sunny Optics Co. Ltd, Yuyao, China.......................................................................................................611
110 Organic Polymeric Coatings Deposited by CVD/PECVD for Electornics Applications
R.W. Sabnis, A.P. Farnsworth II, and S.S. Scott, Brewer Science Inc., Rolla, MO................................................616
Vendor Poster Presentations
111 Non-Contaminating Magnetic Bearing/Motor—ISAM
P.J. Morgan, Magmotor Power Systems, Brighton, MI ..........................................................................................621
112 The Integrated Solution: Cost Effective Automation from Pfeiffer Vacuum
M. Trunca, Pfeiffer Vacuum, Inc., Nashua, NH......................................................................................................623
Author Index................................................................................................................................................................625
Advertisments—including SVC Proceedings CD-ROM Order Form.....................................................................630
*SVC Student Presenter
Nathaniel H. Sugerman Memorial Award
The Nathaniel H. Sugerman Memorial Award was established to commemorate the enduring efforts of
Nat Sugerman in founding, nuturing, and supporting the Society of Vacuum Coaters.
The purpose of the award is to encourage and recognize distinguished achievement in one or more of
the following endeavors.
• For distinguished services to the SVC
• For outstanding technical achievement
• For noteworthy educational contributions to the vacuum industry
• For creative innovation in the development of a product or a process pertaining to the vacuum
industry
The Nathaniel H. Sugerman Memorial Award has honored the following individuals:
1993—Hugh R. Smith, Jr., Industrial Vacuum Engineering
1994—Marsbed Hablanian, Varian Vacuum Products, Inc.
1995—Richard A. Denton, Denton Vacuum, Inc.
1996—Dale Missimer, Polycold Systems International
1997—Alan Plaisted, Soleras Ltd.
1998—Peter J. Clarke, Sputtered Films, Inc.
1999—Ernst K. Hartwig, EKH Consulting
2000—Peter R. Denton, Denton Vacuum, LLC
2001—Robert Cormia, Southwall Technologies, Inc.
2002—H. Angus Macleod, Thin Film Center, Inc.
ix