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About Surface Engineering of Nanomaterials: Lecture 12: Physical Vapour Deposition (PVD)
This document discusses various physical vapor deposition (PVD) techniques including thermal evaporation, electron beam evaporation, reactive/activated reactive electron beam evaporation, sputtering, and their comparison. Thermal evaporation uses resistive heating to evaporate materials, while electron beam evaporation uses an electron beam to bombard a target. Reactive processes introduce gases to deposit compound films. Sputtering uses plasma to eject target material which deposits on a substrate. PVD techniques are used to deposit thin films for applications such as coatings, semiconductors, and aerospace.
Detailed Information
| Author: | ['hrana287'] |
|---|---|
| Publication Year: | 2020 |
| Pages: | 19 |
| Language: | English |
| Format: | |
| Price: | FREE |
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