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About SRIM Tutorial 1 - Ion Ranges, Doses and Damage
This tutorial covers using SRIM software to simulate ion implantation for doping silicon. It determines that phosphorus ions at 190 keV would provide a peak concentration depth of 250 nm, as required. A TRIM simulation is run using these parameters and shows the ion collisions as red dots and recoil cascades from silicon atoms as green dots deep within the silicon target. The simulation provides insight into ion ranges, doses needed for implantation, and amorphization of the target material.
Detailed Information
| Author: | ['Valael1'] |
|---|---|
| Publication Year: | 2015 |
| Pages: | 6 |
| Language: | English |
| Format: | |
| Price: | FREE |
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