Plasma Nanoscience: Basic Concepts and Applications of Deterministic Nanofabrication

557 Pages·2008·5.506 MB·English

by  Prof. Kostya (Ken) Ostrikov(auth.)

Kostya (Ken) Ostrikov
Plasma Nanoscience
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Kostya (Ken) Ostrikov
Plasma Nanoscience
Basic Concepts and Applications
of Deterministic Nanofabrication

WILEY-VCH Verlag GmbH & Co. KGaA
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Prof. Kostya (Ken) Ostrikov
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ToTina,withloveandappreciation
VII
Contents
Preface XI
Acronyms XXIII
1 Introduction 1
1.1 MainConceptsandIssues 2
1.2 Self-OrganizedNanoworld,CommonsenseScienceoftheSmall
andSocio-EconomicPush 7
1.3 Nature’sPlasmaNanofabandNanotechnologyResearch
Directions 21
1.4 DeterministicNanofabricationandPlasmaNanoscience 28
1.5 StructureoftheMonographandAdvicetotheReader 43
2 WhatMakesLow-TemperaturePlasmasaVersatileNanotool? 49
2.1 BasicIdeasandMajorIssues 50
2.2 PlasmaNanofabricationConcept 55
2.3 UsefulPlasmaFeaturesforNanoscaleFabrication 66
2.4 ChoiceandGenerationofBuildingandWorkingUnits 72
2.5 EffectofthePlasmaSheath 81
2.6 HowPlasmasAffectElementarySurfaceProcesses 97
2.7 ConcludingRemarks 105
3 SpecificExamplesandPracticalFramework 107
3.1 SemiconductingNanofilmsandNanostructures 107
3.2 Carbon-BasedNanofilmsandNanostructures 117
3.3 PracticalFramework–BridgingNineOrdersofMagnitude 133
3.4 ConcludingRemarks 140
4 GenerationofBuildingandWorkingUnits 145
4.1 SpeciesinMethane-BasedPlasmasforSynthesisofCarbon
Nanostructures 146
PlasmaNanoscience:BasicConceptsandApplicationsofDeterministicNanofabrication
Kostya(Ken)Ostrikov
Copyright(cid:1)c 2008WILEY-VCHVerlagGmbH&Co.KGaA,Weinheim
ISBN:978-3-527-40740-8
VIII Contents
4.1.1 ExperimentalDetails 149
4.1.2 BasicAssumptionsoftheModel 152
4.1.3 ParticleandPowerBalanceinPlasmaDischarge 153
4.1.4 DensitiesofNeutralandChargedSpecies 155
4.1.4.1 EffectofRFPower 156
4.1.4.2 EffectofArgonandMethaneDilution 158
4.1.5 DepositedNeutralandIonFluxes 159
4.1.6 MostImportantPointsandSummary 162
4.2 SpeciesinAcetylene-BasedPlasmasforSynthesisof
CarbonNanostructures 164
4.2.1 FormulationoftheProblem 165
4.2.2 NumberDensitiesoftheMainDischargeSpecies 167
4.2.3 FluxesofBuildingandWorkingUnits 171
4.3 NanoclusterandNanoparticleBuildingUnits 177
4.3.1 Nano-SizedBuildingUnitsfromReactivePlasmas 177
4.3.2 NanoparticleGeneration: OtherExamples 182
4.4 ConcludingRemarks 194
5 Transport,ManipulationandDepositionofBuildingand
WorkingUnits 199
5.1 MicroscopicIonFluxesDuringNanoassemblyProcesses 200
5.1.1 FormulationandModel 202
5.1.2 NumericalResults 204
5.1.3 InterpretationofNumericalResults 209
5.2 NanoparticleManipulationintheSynthesisofCarbon
Nanostructures 213
5.2.1 NanoparticleManipulation: ExperimentalResults 215
5.2.2 NanoparticleManipulation: NumericalModel 220
5.3 Selected-AreaNanoparticleDepositionOntoMicrostructured
Surfaces 227
5.3.1 NumericalModelandSimulationParameters 228
5.3.2 Selected-AreaNanoparticleDeposition 231
5.3.3 PracticalImplementationFramework 237
5.4 ElectrostaticNanoparticleFilter 239
5.5 ConcludingRemarks 244
6 SurfaceScienceofPlasma-ExposedSurfacesand
Self-OrganizationProcesses 249
K.OstrikovandI.Levchenko
6.1 SynthesisofSelf-OrganizingArraysofQuantumDots:
ObjectivesandApproach 251
Contents IX
6.2 InitialStageofGe/SiNanodotFormationUsingNanocluster
Fluxes 272
6.2.1 PhysicalModelandNumericalDetails 273
6.2.2 PhysicalInterpretationandRelevantExperimentalData 277
6.3 BinarySi C QuantumDotSystems: InitialGrowthStage 282
x 1-x
6.3.1 AdatomFluxesatInitialGrowthStagesofSi C Quantum
x 1–x
Dots 282
6.3.2 ControlofCore-ShellStructureandElementalComposition
ofSi C QuantumDots 294
x 1-x
6.4 Self-OrganizationinGe/SiNanodotArraysatAdvanced
GrowthStages 301
6.4.1 ModelofNanopatternDevelopment 303
6.4.2 Ge/SiQDSizeandPositionalUniformity 307
6.4.3 Self-OrganizationinGe/SiQDPatterns: DrivingForcesand
Features 310
6.5 Self-OrganizedNanodotArrays: Plasma-SpecificEffects 314
6.5.1 MatchingBalanceandSupplyofBUs: aRequirementfor
DeterministicNanoassembly 315
6.5.2 OtherGeneralConsiderations 317
6.5.3 Plasma-RelatedEffectsatInitialGrowthStages 319
6.5.4 SeparateGrowthofIndividualNanostructures 321
6.5.5 Self-OrganizationinLargeNanostructureArrays 327
6.6 ConcludingRemarks 332
7 Ion-FocusingNanoscaleObjects 341
7.1 GeneralConsiderationsandElementaryProcesses 343
7.2 Plasma-SpecificEffectsontheGrowthofCarbonNanotubes
andRelatedNanostructures 356
7.2.1 Plasma-RelatedEffectsonCarbonNanofibers 357
7.2.2 EffectsofIonsandAtomicHydrogenontheGrowthof
SWCNTs 364
7.3 Plasma-ControlledReshapingofCarbonNanostructures 373
7.3.1 Self-SharpeningofPlatelet-StructuredNanocones 373
7.3.2 Plasma-BasedDeterministicShapeControlinNanotip
Assembly 380
7.4 Self-OrganizationofLargeNanotipArrays 385
7.5 FromNon-UniformCatalystIslandstoUniform
Nanoarrays 391
7.5.1 ExperimentandFilmCharacterization 393
7.5.2 GrowthModelandNumericalSimulations 397
7.6 OtherIon-FocusingNanostructures 402
7.7 ConcludingRemarks 407
X Contents
8 BuildingandWorkingUnitsatWork: Applications 415
8.1 Plasma-BasedPost-ProcessingofNanoarrays 416
8.1.1 Post-ProcessingofNanotubeArrays 418
8.1.2 FunctionalMonolayerCoatingofNanorodArrays 422
8.2 i-PVDofMetalNanodotArraysUsingNanoporous
Templates 427
8.3 MetalOxideNanostructures: Plasma-GeneratedBUsCreate
OtherBUsontheSurface 434
8.4 BiocompatibleTiO Films: HowBuildingUnitsWork 440
2
8.4.1 TiO FilmDepositionandCharacterization 442
2
8.4.2 InVitroApatiteFormation 446
8.4.3 GrowthKinetics: BuildingUnitsatWork 448
8.4.4 BuildingUnitsInVitro: InducingBiomimeticResponse 453
8.5 ConcludingRemarks 456
9 ConclusionsandOutlook 461
9.1 DeterminismandHigherComplexity 464
9.2 Plasma-RelatedFeaturesandAreasofCompetitive
Advantage 467
9.3 OutlookfortheFuture 470
9.4 FinalRemarks 479
10 AppendixA.ReactionsandRateEquations 483
10.1 PlasmasofAr+H +CH GasMixtures(Section4.1) 483
2 4
10.2 PlasmasofAr+H +C H GasMixtures(Section4.2) 486
2 2 2
11 AppendixB.WhyPlasma-basedNanoassembly:
FurtherReasons 491
11.1 CarbonNanotubesandRelatedStructures 491
11.2 SemiconductorNanostructuresandNanomaterials 493
11.3 OtherNanostructuresandNanoscaleObjects 494
11.4 MaterialswithNanoscaleFeatures 496
11.5 Plasma-RelatedIssuesandFabricationTechniques 497
References 499
Index 529
XI
Preface
Applications of low-temperature plasmas for nanofabrication is a very
newandquicklyemergingareaatthefrontierofphysicsandchemistry
of plasmas and gas discharges, nanoscience and nanotechnology, solid-
statephysics,andmaterialsscience.Suchplasmasystemscontainawide
rangeofneutralandcharged,reactiveandnon-reactivespecieswiththe
chemical structure and other properties that make them indispensable
fornanoscalefabricationofexoticarchitecturesofdifferentdimensional-
ity and functional thin films and places uniquely among other existing
nanofabricationtools. Bynanoscales,itistypicallyimpliedthatthespa-
tialscalesconcernedareabove1nm(= 10−9m)andbelowfewhundred
nm.
Inthelastdecade,therehasbeenastrongtrendtowardsanincreasing
useofvariousplasma-basedtoolsfornumerousprocessesatnanoscales,
includingplasma-aidednanoassemblyofindividualnanostructuresand
their intricate nanopatterns, deposition of nanostructured functional
materials (including biomaterials), nanopatterns and interlayers, syn-
thesis of quantum confinement structures of different dimensionality
(e.g.,zero-dimensionalquantumdots,one-dimensionalnanowires,two-
dimensional nanowalls and nanowells, and intricate three-dimensional
nanostructures), surface profiling and structuring with nanoscale fea-
tures, functionalization of nanostructured surfaces and nanoarrays,
ultra-high precision plasma-assisted reactive chemical etching of sub-
100nm-wideandhigh-aspect-ratiotrenchesandseveralothers.
In many applications (such as in commonly used plasma-assisted re-
active chemical etching of semiconductor wafers in microelectronics),
plasma-based nanotools have shown superior performance compared
to techniques primarily based on neutral gas chemistry such as chemi-
cal vapor deposition (CVD). However, compared to neutral gas routes,
in low-temperature plasmas there appears another level of complexity
related to the necessity of creating and sustaining a suitable degree of
ionization and a much larger number of species generated in the gas
PlasmaNanoscience:BasicConceptsandApplicationsofDeterministicNanofabrication
Kostya(Ken)Ostrikov
Copyright(cid:1)c 2008WILEY-VCHVerlagGmbH&Co.KGaA,Weinheim
ISBN:978-3-527-40740-8