Table Of ContentCONTRIBUTORS TO THIS VOLUME
F. M. D'HEURLE H. KRESSEL
D. B. DOVE H. NELSON
W. R. HUNTER R. ROSENBERG
V. K. SRIVASTAVA
Physics of Thin Films
Advances in Research and Development
Edited by
GEORG HASS
Night Vision Laboratory
U.S. Army Electronics Command
Fort Belvoir, Virginia
MAURICE H. FRANCOMBE
Research and Development Center
Westinghouse Electric Corporation
Pittsburghj Pennsylvania
RICHARD W. HOFFMAN
Department of Physics
Case Western Reserve University
Cleveland, Ohio
VOLUME 7
1973
ACADEMIC PRESS NEW YORK AND LONDON
A Subsidiary of Harcourt Brace Jovanovich, Publishers
COPYRIGHT © 1973, BY ACADEMIC PRESS, INC.
ALL RIGHTS RESERVED.
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PRINTED IN THE UNITED STATES OF AMERICA
Contributors to Volume 7
Numbers in parentheses indicate the pages on which the authors' contributions begin.
F. M. D'HEURLE {257), IBM Thomas J. Watson Research Center, York-
town Heights, New York
D. B. DOVE (1), Department of Materials Science and Engineering, Uni-
versity of Florida, Gainesville, Florida
W. R. HUNTER (43), E. 0. Hulburt Center for Space Research, U.S. Naval
Research Laboratory, Washington, D.C.
H. KRESSEL (115), RCA Laboratories, Princeton, New Jersey
H. NELSON (115), RCA Laboratories, Princeton, New Jersey
R. ROSENBERG (257), IBM Thomas J. Watson Research Center, Yorktown
Heights, New York
V. K. SRIVASTAVA (311), Department of Physics, University of Roorkee,
Roorkee, India
vii
Preface
The appearance of Volume 7 in the publication Physics of Thin Films
marks the end of the first decade for this series. To date, some 35 review
articles have appeared in previous volumes, covering many different
aspects of thin film physics and technology. The fact that new topics in
thin films continue to emerge and reach a stage where a critical review
is called for appears to speak favorably for the essential health and
growth potential of this relatively young area of science.
The present volume (in common with earlier publications) contains a
widely diverse group of topics. Although being treated for the first time,
in some respects they complement and extend upon earlier articles. Readers
will find that previous reviews, particularly on film growth and structure,
optical properties, and semiconducting films, will furnish useful background
reading to the subjects covered in this volume.
In the first article the status of research on the structure of amorphous
films is reviewed by D. B. Dove. This is the first of several reviews which
are planned for future volumes on various aspects of the important and
rapidly developing field of structurally disordered films. An article dealing
with the dc electrical conductivity behavior of amorphous films by A. K.
Jonscher and R. M. Hill is scheduled for Volume 8.
The second chapter by W. R. Hunter deals with metal film optical
filters for use in the extreme ultraviolet. In particular, the preparation,
optical properties, and applications of unbacked metal filters in laboratory
and space instrumentation are discussed. This article is the tenth in the
area of thin film optics to be published in the Physics of Thin Films series,
and readers interested in this field will find complete discussions of related
aspects in earlier volumes.
The third article by H. Kressel and H. Nelson presents a timely review
of the impressive body of work that has developed in recent years in the
new field of liquid phase epitaxy. This growth technique is rapidly finding
application , especially in the fabrication of high-quality single-crystal
layers of semiconductor and magnetic oxide materials, and the authors
place special and authoritative emphasis on III-V compound layers for
use in optical and microwave devices.
The fourth review covers a topic which has long been a fundamental
interest to metallurgists and thin film physicists, and more recently has
ix
X PREFACE
achieved special significance for the designers of thin film microcircuit
components, i.e., electromigration in thin films. F. M. d'Heurle and R.
Rosenberg survey recent developments in this technologically important
field and discuss both the effects observed in pure metal films and the
inhibiting influence of alloying additives. Incidentally, newcomers to
the field of metal films should find that previous articles in this series on
film growth and structure (Volume 4) and mechanical properties (Volume
3) provide useful supplementary reading.
In the fifth and final chapter of this volume, a novel thin film topic
not hitherto included in this series is introduced. V. K. Srivastava covers
in some detail the historical background, preparation, and structural,
optical, and electrical properties of built-up molecular films, and concludes
by summarizing some of the interesting and diverse applications of such
layers, e.g., in thickness gauges, optical and X-ray gratings, chemical
analyses, and dielectric film devices.
As a closing note for this preface, and in preparation for entry into a
second decade of publication for these volumes, we wish to reiterate a
plea made in the preface to Volume 1. Criticisms, suggestions, and com-
ments by readers (and contributors) are invited and welcomed. Inputs
of this kind are invaluable to the editors in helping to respond to and
anticipate the needs of thin film workers for up-to-date critical reviews.
G. HASS
M. H. FRANCOMBE
R. W. HOFFMAN
Contents of Previous Volumes
Volume 1
Ultra-High Vacuum Evaporators and Residual Gas Analysis
Hollis L. Caswell
Theory and Calculations of Optical Thin Films
Peter H. Berning
Preparation and Measurement of Reflecting Coatings for the Vacuum Ultraviolet
Robert P. Madden
Structure of Thin Films
Rudolf E. Thun
Low Temperature Films
William B. Ittnery III
Magnetic Films of Nickel-Iron
Emerson W. Pugh
AUTHOR INDEX-SUBJECT INDEX
Volume 2
Structural Disorder Phenomena in Thin Metal Films
C. A. Neugebauer
Interaction of Electron Beams with Thin Films
C. J. Calbick
The Insulated-Gate Thin-Film Transistor
Paul K. Weimer
Measurement of Optical Constants of Thin Films
0. S. Heavens
Antireflection Coatings for Optical and Infrared Optical Materials
J. Thomas Cox and Georg Hass
Solar Absorptance and Thermal Emittance of Evaporated Coatings
Louis F. Drummeter, Jr. and Georg Hass
Thin Film Components and Circuits
N. Schwartz and R. W. Berry
AUTHOR INDEX-SUBJECT INDEX
xi
xii CONTENTS OF PREVIOUS VOLUMES
Volume 3
Film-Thickness and Deposition-Rate Monitoring Devices and Techniques for
Producing Films of Uniform Thickness
Klaus H. Behrndt
The Deposition of Thin Films by Cathode Sputtering
Leon I. Maissel
Gas-Phase Deposition of Insulating Films
L. V. Gregor
Methods of Activating and Recrystallizing Thin Films of ll-VI Compounds
A. Vecht
The Mechanical Properties of Thin Condensed Films
R. W. Hoffman
Lead Salt Detectors
D. E. Bode
AUTHOR INDEX-SUBJECT INDEX
Volume 4
Precision Measurements in Thin Film Optics
H. E. Bennett and Jean M. Bennett
Nucleation Processes in Thin Film Formation
J. P. Hirth and K. L. Moazed
Evaporated Single-Crystal Films
J. W. Matthews
The Growth and Structure of Electrodeposits
Kenneth R. Lawless
Thin Glass Films
W. A. Pliskin, D. R. Kerr, and J. A. Perri
Hot-Electron Transport and Electron Tunneling in Thin Film Structures
C. R. Crowell and S. M. Sze
AUTHOR INDEX-SUBJECT INDEX
Volume 5
Interference Photocathodes
D. Kossel, K. Deutscher, and K. Hirschberg
CONTENTS OF PREVIOUS VOLUMES xiii
Design of Multilayer Interference Filters
Alfred Thelen
Oxide Layers Deposited from Organic Solutions
H. Schroeder
The Preparation and Properties of Semiconductor Films
M. H. Francombe and J. E. Johnson
The Preparation of Films by Chemical Vapor Deposition
W. M. Feisty S. R. Steele, and D. W. Readey
AUTHOR INDEX-SUBJECT INDEX
Volume 6
Anodic Oxide Films
C. </. Dell'Oca, D. L. Pulfrey, and L. Young
Size-Dependent Electrical Conduction in Thin Metal Films and Wires
D. C. Larson
Optical Properties of Metallic Films
F. Abeles
Interactions in Multilayer Magnetic Films
Arthur Yelon
Diffusion in Metallic Films
C. Weaver
AUTHOR INDEX-SUBJECT INDEX
Articles Planned for Future Volumes
Metal-Dielectric Interference Filters
P. W. Baumeister and Verne Robert Costich
Thin Film Transducers
J. deKlerk
Design and Manufacture of Nonconventional Optical-Thin-Film Filters
J. A. Dobrowolski
Inhomogeneous and Coevaporated Homogeneous Films for Optical Applications
Roland Jacobsson
Electrical Conduction in Disordered Nonmetallic Films
A. K. Jonscher and R. M. Hill
Discontinuous and Cermet Films
Z. H. Meiksin
Topologically Structured Thin Films in Semiconductor Device Operation
H. C. Nathanson and Jens Guldberg
Film Materials for Optical Applications
E. Ritter
Dielectric Films for Passivation and Protection of Semiconductor Devices
J. R. Szedon
Thin Films for Integrated Optics
R. Ulrich
