Table Of ContentPlasma Physics
Nonthermal Plasma
Nonthermal Plasma
Chemistry and Physics
Chemistry and Physics
edited by
In addition to introducing the basics of plasma physics, Nonthermal Plasma Jürgen Meichsner
Chemistry and Physics is a comprehensive presentation of recent develop-
ments in the rapidly growing field of nonthermal plasma chemistry. The book Martin Schmidt
offers a detailed discussion of the fundamentals of plasma chemical reactions
Ralf Schneider
and modeling, nonthermal plasma sources, relevant diagnostic techniques,
and selected applications. Hans-Erich Wagner
Features
• Includes a compact introduction in the nonthermal plasma
physics and plasma–surface interaction
• Classifies the plasma sources and chemical plasma reactors,
and provides important similarity parameters
• Overviews experimental methods in plasma diagnostics and
surface (thin film) analysis
• Presents detailed research results with modeling and applications
• Promotes strategies in plasma modeling and provides specific
methods, including examples
Elucidating interconnections and trends, the book focuses on basic princi-
ples and illustrations across a broad field of applications. Expert contributors
address environmental aspects of plasma chemistry. The book also includes
selected plasma conditions and specific applications in volume plasma
chemistry and treatment of material surfaces such as plasma etching in
microelectronics, chemical modification of polymer surfaces and deposition
of functional thin films. Designed for students of plasma physics, Nonthermal
Plasma Chemistry and Physics is a concise resource also for specialists
in this and related fields of research.
59165
ISBN: 978-1-4200-5916-8
90000
9 781420 059168
59165_Cover_mech.indd 1 9/28/12 10:20 AM
Nonthermal Plasma
Chemistry and Physics
© 2013 by Taylor & Francis Group, LLC
© 2013 by Taylor & Francis Group, LLC
Nonthermal Plasma
Chemistry and Physics
edited by
Jürgen Meichsner
Martin Schmidt
Ralf Schneider
Hans-Erich Wagner
Boca Raton London New York
CRC Press is an imprint of the
Taylor & Francis Group, an informa business
© 2013 by Taylor & Francis Group, LLC
Cover design by Sascha Meichsner and Carsten Desjardins.
CRC Press
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© 2013 by Taylor & Francis Group, LLC
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No claim to original U.S. Government works
Version Date: 20121207
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© 2013 by Taylor & Francis Group, LLC
Contents
Preface .................................................................................vii
Acknowledgments..................................................................... ix
Editors ................................................................................. xi
Contributors...........................................................................xiii
Chapter1 Introduction..............................................................1
Chapter2 NonthermalPlasmaChemicalProcessesofGeneralInterest..........7
Chapter3 PhysicsofNonthermalPlasmas........................................15
Chapter4 NonthermalPlasmaChemicalReactors ............................. 137
Chapter5 ElementaryProcessesonSurfacesin
Plasma–WallInteraction.............................................. 163
Chapter6 PlasmaDiagnostics................................................... 187
Chapter7 SurfaceandThinFilmAnalysis ..................................... 255
Chapter8 SelectedApplications................................................. 285
Chapter9 ModelingandSimulation ............................................ 407
Chapter10 TrendsandNewConcepts .......................................... 469
References........................................................................... 473
Index................................................................................. 539
v
© 2013 by Taylor & Francis Group, LLC
© 2013 by Taylor & Francis Group, LLC
Preface
Plasmaprocessingisoneofthekeytechnologiesworldwide,especiallyusingnon-
thermal, low-temperature plasmas. Recently, the situation is characterized by the
fast-growing interest in the optimization of existing applications as well as the
developmentofnewones.
This book provides a basic introduction to nonthermal plasma chemistry and
physicsforstudentsofplasmaphysics,PhDstudents,andscientists.Thefundamen-
tals of plasma chemical reactions and its modeling, most importantly nonthermal
plasmasources,relevantdiagnostictechniques,aswellasselectedapplications,are
presentedanddiscussedinasystematicmanner.Interconnectionsareshown;trends
andnewconceptsareillustrated.Thechaptersdiscussthebasicprinciplesandpro-
videexemplaryillustrationsofthewidefieldofapplications.Therefore,itisnotthe
aim of this book to give a complete overview of the state of the art in the research
areas. For this, the readers can refer to already existing excellent monographs and
topicalreviewsgiveninthereferences.
Thebookisbasedoncontributionsfrominternationallyknownexpertsintheir
research fields, using examples from their own scientific activities to illustrate the
basicprincipleswithapplications.
Afterashortintroductiontothefieldofnonthermalplasmachemistrywithsome
historicalnotesanditsspecificcharacteristics,topicsofgeneralinterestinthisfieldare
brieflypresented,whichillustratethebroadspectrumofapplications.Dryairplasma
chemistrywithozonegenerationorlacquerstrippingandashingreactionsarebriefly
discussed.Plasmaetchingpresentsakeytechnologyinintegratedcircuitproduction.
Methane gas reformation as well as diamond deposition are important topics of
hydrocarbonplasmachemistry.Theformationofpre-biochemicalcompoundsisalso
observedinnonthermalplasmas.Thinfilmgenerationofplasmapolymers,ofmetallic
compounds,andsilicone-basedcellsareproductsofplasmachemicalprocesses.
Thefundamentals,sources,anddiagnosticsofnonthermalplasmasarediscussed
next. The basic concepts of plasma physics for thermal and nonthermal plasmas,
includingcollisionalprocesses,plasmakinetics,andmacroscopictransportequations,
areintroduced.Duetotheimportanceofsurfaceprocessesinmanyapplications,the
plasma-wallboundaryisalsoconsidered.Thebasicphysicsofdifferentnonthermal
plasmasofelectricdischargesandtherealizationsfortechnicalplasmasourcesare
presentedattheendofthischapter.
Nonthermal plasma reactors are characterized in terms of the principles of
chemicalquasi-equilibria,macroscopickinetics,andplasmachemicalsimilarity.
Plasma–surface interaction is one of the fastest-growing branches in plasma
physicsandhasgotanimportantissueinthefieldofappliedsurfacescience.Itsbasic
question concerns the mastering of an old problem: the contact of different states
of matter. The investigation and application of plasma–surface interaction plays an
essential role inlow-temperature plasma processing such as etching, deposition, or
modification of surfaces as well as in fusion research. Therefore, such elementary
processesonsurfacesincontactwithplasmasarediscussed.Theparticleandenergy
balanceatthesurfacedeterminetheimportanceofthedifferentmechanisms.
vii
© 2013 by Taylor & Francis Group, LLC
viii Preface
According to the broad spectrum of plasma components, different tasks exist
for the investigation of the plasma to understand the processes and to control
chemical reactions characteristic of the various applications. Therefore, the funda-
mentalsofprobemeasurements,microwaveinterferometry,emissionandabsorption
spectroscopy,laser-inducedfluorescencespectroscopy,andgaschromatographyare
discussed.
Complementary techniques needed for surface and thin film analysis are
presentednext.
The first part of the next chapter presents examples of applications of volume
plasma chemistry. The reactions take place in the volume, as pure gas phase reac-
tions, or in heterogeneous processes with participation of the surface of substrates,
electrodes, or walls, sometimes assisted by catalytic effects. The second part con-
cernsapplicationsofsurfacechemistry.Heretheplasmachemicalreactionsresultin
changesinsurfaceproperties.Thereactionsmayinvolvevolumeprocesses,butthe
essentialreactionstakeplaceatthesurface.Etchingandthinfilmdepositionaswell
assurfacefunctionalizationuptoplasmamedicalapplicationsarepresented.
Modelingandsimulationprovideanincreasingnumberoftoolstoimprovethe
basicunderstandingofnonthermalplasmasandallowpredictivestudiesforoptimiza-
tionofprocesses.Thehierarchyofplasmamodelsisexplainedatthebeginningofthe
nextchapter,followedbyadiscussionoftheoreticalconceptsforelementaryvolume
and surface processes in gas discharges. The chapter concludes with an example
ofmodeling,namely,thespatiotemporaldynamicsinradio-frequencydischargesof
oxygenanditscomparisonwithexperimentalresults.
The book concludes with a discussion of trends and new concepts in this
fascinatinganddynamicresearcharea.
© 2013 by Taylor & Francis Group, LLC
Acknowledgments
Wewouldliketoexpressourdeepgratitudetoallcoauthors.Theyarethefundament
onwhichthisworkisbased.
AveryspecialthankyougoestoAndreaKleiber(Max-Planck-InstitutfürPlasma-
physik,TeilinstitutGreifswald,EURATOMAssociation,Greifswald)forherendless
patience and amazing support. The book would never have been completed with-
out her uncountable contributions and her careful attention. Bert Krames helped as
emergencysupportinthefinalprocessingandtransformedtheimpossibleintoreality.
WewouldalsoliketogratefullyacknowledgetheworkofMarcelBeu(Leibniz-
InstitutfürPlasmaforschungundTechnologiee.V.(INPGreifswald))forhelpingus
withthedrawings.
ThisworkwaspartlysupportedbytheDeutscheForschungsgemeinschaft,Son-
derforschungsbereichTransregio24.Oneoftheeditors(M.S.)appreciatesthesupport
oftheINPGreifswald.
VeryspecialthanksgotoLanceWobusofTaylor&FrancisGroupforhisvaluable
adviceandhispatienceduringthepreparationofthisbook.Wegavehimahardtime
withthisproject,buthewasalwaysgivingusabackupwheneverproblemsappeared.
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© 2013 by Taylor & Francis Group, LLC
