Table Of ContentMicrolithography
Microlithography
Science and Technology
Third Edition
Edited by
Bruce W. Smith and Kazuaki Suzuki
Third edition published 2020
by CRC Press
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and by CRC Press
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© 2020 Taylor & Francis Group, LLC
First edition published by CRC Press 1998
Second edition published by CRC Press 2007
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Library of Congress Cataloging-in-Publication Data
Names: Smith, Bruce W., 1959- editor. | Suzuki, Kazuaki, editor.
Title: Microlithography : science and technology / edited by Bruce W. Smith
and Kazuaki Suzuki.
Description: Third edition. | Boca Raton : CRC Press, 2020. | Includes
bibliographical references and index. | Summary: “Like the bestselling
original, this third edition of Microlithography is a self-contained
text detailing both elementary and advanced aspects of submicron
microlithography, offering a balanced treatment of theoretical and
operating practices”-- Provided by publisher.
Identifers: LCCN 2019053732 | ISBN 9781439876756 (hbk) | ISBN
9781315117171 (ebk)
Subjects: LCSH: Microlithography--Industrial applications. | Integrated
circuits--Masks. | Metal oxide semiconductors, Complementary--Design and
construction. | Manufacturing processes.
Classifcation: LCC TK7836 .M525 2020 | DDC 621.3815/31--dc23
LC record available at https://lccn.loc.gov/2019053732
ISBN: 978-1-4398-7675-6 (hbk)
ISBN: 978-1-315-11717-1 (ebk)
Typeset in Times
by Deanta Global Publishing Services, Chennai, India
Contents
Preface to Third Edition ..................................................................................................................vii
Editors ...............................................................................................................................................ix
Contributors ......................................................................................................................................xi
Chapter 1 Lithography, Etch, and Silicon Process Technology ....................................................1
Matthew Colburn, Derren N. Dunn, and Michael A. Guillorn
Chapter 2 Optical Nanolithography ............................................................................................ 41
Bruce W. Smith
Chapter 3 Multiple Patterning Lithography .............................................................................. 141
Carlos Fonseca, Chris Bencher, and Bruce Smith
Chapter 4 EUV Lithography ..................................................................................................... 163
Stefan Wurm, Winfried Kaiser, Udo Dinger, Stephan Müllender,
Bruno La Fontaine, Obert R. Wood II, and Mark Neisser
Chapter 5 Alignment and Overlay ............................................................................................247
David Laidler and Gregg M. Gallatin
Chapter 6 Design for Manufacturing and Design Process Technology Co-Optimization .......293
John Sturtevant and Luigi Capodieci
Chapter 7 Chemistry of Photoresist Materials .......................................................................... 327
Takumi Uemo, Robert D. Allen, and James Thackeray
Chapter 8 Photoresist and Materials Processing ....................................................................... 419
Bruce W. Smith
Chapter 9 Optical Lithography Modeling .................................................................................493
Chris A. Mack, John J. Biafore, and Mark D. Smith
Chapter 10 Maskless Lithography .............................................................................................. 555
Kazuaki Suzuki
Chapter 11 Imprint Lithography .................................................................................................595
Doug Resnick and Helmut Schift
v
vi Contents
Chapter 12 Metrology for Nanolithography................................................................................ 679
Kazuaki Suzuki and Eran Amit
Chapter 13 Directed Self-Assembly of Block Copolymers ........................................................ 767
Chi-chun Liu, Kenji Yoshimoto, Juan de Pablo, and Paul Nealey
Index ..............................................................................................................................................825
Preface to Third Edition
Semiconductor micro- and nanolithography continues to provide the necessary support to drive
Moore’s Law with future nanometer-scale device generations. With technological innovation in
imaging systems, materials, processing, modeling, and optimization, what had once been envi-
sioned as technical barriers to advancement are continually surpassed to allow increasingly more
capable devices. The drumbeat of smaller, faster, cheaper, and lower power continues as the world
moves into new technology applications demanding tremendously increased processing and storage
capacity. Combined with new forefronts in electronics and photonics, the applications for nano-
electronic devices have grown well beyond the needs of microlithography covered in the frst and
second editions of Microlithography: Science and Technology.
To address the new technology that has evolved over the last several years, this Third Edition
of Microlithography: Science and Technology has been completely revised. While providing a
balanced treatment of theoretical and operational considerations, from fundamental principles to
advanced topics of nanoscale lithography, this edition details the technology necessary for current
and future device generations. It provides the necessary reference for students and engineers to
learn the fundamental as well as understand the future requirements of the challenging technology
behind lithography at the nano scale. It also provides the basis for more experienced engineers to
understand the interdisciplinary nature of microlithography, which involves aspects of many areas
of science and engineering.
The book is divided into 13 chapters, starting with an overview of the lithography requirements
of semiconductor processing (Lithography, Etch, and Silicon Process Technology, Chapter 1) and
exploring the details of all the technologies involved. Chapters include Optical Nanolithography
(Chapter 2), Multiple Patterning Lithography (Chapter 3), EUV Lithography (Chapter 4), Alignment
and Overlay (Chapter 5), Design for Manufacturing and Design Process Technology Co-optimization
(Chapter 6), Chemistry of Photoresist Materials (Chapter 7), Photoresist and Materials Processing
(Chapter 8), Optical Lithography Modeling (Chapter 9), Maskless Lithography (Chapter 10),
Imprint Lithography (Chapter 11), Metrology for Nanolithography (Chapter 12), and Directed
Self-Assembly of Block Copolymers (Chapter 13). The Third Edition has involved contributions
from 29 renowned experts from the world’s leading academic and industrial organizations to pro-
vide in-depth coverage of these technologies. As a result, we are certain that the Third Edition of
Microlithography: Science and Technology will remain a highly valuable resource for students,
engineers, and researchers well into the future.
Bruce W. Smith
Kazuaki Suzuki
vii
Editors
Bruce W. Smith is a Distinguished Professor of engineering at the Rochester Institute of Technology.
He has been involved in teaching and research in microelectronic and microsystems engineering
for over 35 years. His areas of research include semiconductor processing, deep ultraviolet (DUV),
vacuum ultraviolet (VUV), immersion, and extreme ultraviolet (EUV) lithography, thin flms,
optics, and microelectronic materials. He has authored over 250 technical publications, given over
100 technical talks, and received over 25 patents, licensing his technology both nationally and
internationally. He has worked extensively with individuals and organizations in the semiconductor
industry, including industrial partners in the Semiconductor Research Corporation, SEMATECH,
and the IMEC. He is the recipient of numerous teaching and research awards, including the Institute
of Electrical and Electronics Engineers (IEEE) Technical Excellence Award, the American Vacuum
Society (AVS) Excellence in Leadership Award, the Society for Photo-optical Instrumentation
Engineers (SPIE) Research Mentoring Award, and the Rochester Institute of Technology Trustees
Scholarship Award. He has also been inducted into the Rochester Institute of Technology Innovator
Hall of Fame. Professor Smith is a Fellow of the Institute of Electrical and Electronics Engineers,
the Optical Society of America, and the Society for Photo-optical Instrumentation Engineers.
Kazuaki Suzuki majored in plasma physics and X-ray astronomy in the University of Tokyo, Japan.
He has been a project manager for developing new concept exposure tools at Nikon Corporation,
such as the early-generation KrF excimer laser stepper, the frst-generation KrF excimer laser scan-
ner, the electron beam projection exposure system, and the full-feld extreme ultraviolet scanner. He
received his Ph. D. in Precision Engineering from the University of Tokyo about the system design
of exposure tools for microlithography. He has authored and coauthored many papers in the feld of
exposure tool and related technologies, including advanced equipment control by using metrology
data. He also holds numerous patents in the same feld. In the frst decade of this century, he was
a member of the program committee of the Society for Photo-optical Instrumentation Engineers
(SPIE) Microlithography and other international conferences such as Micro & Nano Engineering
in Europe and the International Microprocesses and Nanotechnology Conference in Japan. He was
one of the associate editors of Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) from
2002 to 2009. He moved to Tokyo Tech Academy for Convergence of Materials and Informatics at
Tokyo Institute of Technology (Tokyo Tech) in March 2019.
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