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Luminous Chemical Vapor Deposition and Interface Engineering PDF

840 Pages·2004·35.803 MB·English
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by Hirotsugu Yasuda| 2004| 840 pages| 35.803| English

About Luminous Chemical Vapor Deposition and Interface Engineering

Yasuda (chemical engineering, University of Missouri-Columbia) provides in-depth coverage of the technologies and various approaches in luminous chemical vapor deposition (LCVD) and showcases the development and use of LCVD procedures in industrial scale applications. The book provides broad coverage of the relationships involved in the interface between gas/solid, liquid/solid, and solid/solid which can be utilized in low-pressure plasma interface engineering, with attention focused on plasma polymerization. Coverage progresses from fundamentals of LCVD through operation of LCVD and LCVT, surfaces and interfaces, and interface engineering.

Detailed Information

Author:Hirotsugu Yasuda
Publication Year:2004
ISBN:9781420030297
Pages:840
Language:English
File Size:35.803
Format:PDF
Price:FREE
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