Download Ion Impantation Technology: 16th International Conference on Ion Implantation Technology; IIT 2006 (AIP Conference Proceedings Accelerators, Beams, and Instrumentations) PDF Free - Full Version
Download Ion Impantation Technology: 16th International Conference on Ion Implantation Technology; IIT 2006 (AIP Conference Proceedings Accelerators, Beams, and Instrumentations) by Karen J. Kirkby, Russell Gwilliam, Andy Smith, David Chivers in PDF format completely FREE. No registration required, no payment needed. Get instant access to this valuable resource on PDFdrive.to!
About Ion Impantation Technology: 16th International Conference on Ion Implantation Technology; IIT 2006 (AIP Conference Proceedings Accelerators, Beams, and Instrumentations)
This is the premier world conference for the presentation of the latest advances in ion implantation, from the fundamentals of ion-solid interactions to manufacturing implant equipment. All papers were peer-reviewed. Ion implantation is used to manufacture semiconductor devices. Materials properties are changed by bombarding wafers with atoms, which are accelerated in an ion implanter.
Detailed Information
| Author: | Karen J. Kirkby, Russell Gwilliam, Andy Smith, David Chivers |
|---|---|
| Publication Year: | 2006 |
| ISBN: | 9780735403659 |
| Pages: | 645 |
| Language: | English |
| File Size: | 31.56 |
| Format: | |
| Price: | FREE |
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