Ion Beams in Nanoscience and Technology

439 Pages·2010·13.499 MB·English

by  Daniel J. White, Harry J. Whitlow (auth.), Ragnar Hellborg, Harry J. Whitlow, Yanwen Zhang (eds.)

Ion Beams in Nanoscience and Technology
Particle Acceleration and Detection
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Ragnar Hellborg Harry J. Whitlow
Yanwen Zhang
Editors
Ion Beams in Nanoscience
and Technology
With a Foreword by
Sir Michael W. Thompson
123
Editors
RagnarHellborg HarryJ.Whitlow
LundUniversity DepartmentofPhysics
DepartmentofPhysics UniversityofJyva¨skyla¨
So¨lvegatan14 FI-40014Jyva¨skyla¨
SE-22362Lund Finland
Sweden
[email protected]
YanwenZhang
PacificNorthwestNationalLaboratory
P.O.Box999
RichlandWA99352
USA
ISSN1611-1052
ISBN978-3-642-00622-7 e-ISBN978-3-642-00623-4
DOI10.1007/978-3-642-00623-4
SpringerHeidelbergDordrechtLondonNewYork
LibraryofCongressControlNumber:2009927002
(cid:2)c Springer-VerlagBerlinHeidelberg2009
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ToGun,IngegerdandBill
Foreword
Tomakethings,howeverlargeorsmall,oneneedstoolsandmeasuringinstruments.
Butbeforeanythingcanbemadebytechnologyonemustunderstandthroughsci-
encehowthetoolsandinstrumentswork.Thisbookisforthosewhowishtomake
thingsthataresosmallthatthepositionandsizeofindividualatomsbegintomatter,
andwheredimensionsaremeasuredinnanometres.
Howcanonecontrolthemakingprocessforsuchthingsandhowcanwevisu-
alise what has been made? Such abilities came with the invention of microscopes
based upon electron or ion optics and devices based upon ion scattering or sput-
teringthatprobebeneathasurface.Theseareinstrumentswhichcanmeasurewith
nanometreprecision.
Whattoolsareavailableforthemakingprocess?Somecamethroughunderstand-
ing atomic collision processes under surfaces bombarded by energetic ions. Some
others came from understanding how energy is lost from ions penetrating beneath
thesurface.Thatsciencegaveussomeofthetoolsfornanotechnologyintheform
of ion accelerators. With these one can precisely shape a surface by sputtering it
away and modify the layer beneath by radiation damage. Also one can make new
alloys or compounds in very thin layers by implanting energetic ions beneath the
surface.
Suchwasthestartingpointformanyendeavoursreportedinthisbook;andhav-
ing been absent myself from any laboratory for many years, it is gratifying to see
howmuchmoreofthescienceiswellunderstoodandhowmanythingsofvalueto
theworldcanbemadethroughthiskindoftechnology.
From the beginning the electronics industry took a commendably long view
by promoting this research in the universities as well as in its own laborato-
ries.Exchanges ofstafftookplaceandcollaboration ensuredtheopportunities for
youngscientiststopursuetheircareersthroughindustrialresearchanddevelopment.
Geographically the field initiated in North America, Europe, and Australasia but
interestquicklyspreadtoAsia,becomingamajoractivityintheburgeoningopto-
electronicsindustriesthere.Industrialscaleplantsarecommonplaceinproduction
units,andthenewerapplicationsextendintothebiomedicalsciencesandelectrome-
chanical engineering. On the human side one could properly say there is now a
third generation of scientists and engineers using ion beams in nanoscience and
technology.
vii
viii
Iexpectthatnewunderstandinggainedthroughcurrentresearchwillenableyet
morenewthingstobemade.Thisbookshouldassistbothactivities.Tothosewho
willmakethediscoveriesandinventionsIexpressthehopethattheymayexperience
personalfulfilmentthroughtherealisationoftheirideas.
Cornwall MichaelThompson
June2009
Editor’s note: Professor Sir Michael W. Thompson was one of the early pio-
neersofatomiccollisionsinsolids,whichformedtheseedfromwhichthemodern
applications of ion beams in nanoscience and technology grew. His contributions
includecornerstonedevelopmentsinsputteringinamorphousmaterialsandsingle
crystalssputtering,surfacescatteringprocesses,andchannelling.Subsequently,Sir
Michael was appointed vice-chancellor of the University of East Anglia and then
Birmingham before a period working in a leading position in the financial sector
afterretirementfromacademiclife.
Preface
Energeticionbeamirradiationisthebasisofawideplethoraofpowerfulresearch
and fabrication techniques for materials characterisation and processing on a
nanometrescale.Ionimplantationisincreasinglyemployedtotailorvariousmate-
rialproperties,focusedionbeamscanbeusedtomachineawayanddepositmate-
rial on a scale of nanometres, and the scattering of energetic ions is a unique and
quantitative tool for process development in high speed electronics. More recent
developments are the use of MeV proton beams and other ions to fabricate 3D
nanostructures with extreme aspect ratios for tissue engineering and nanofluidics
lab-on-a-chipdevices.
The potency of these energetic ion beam techniques lies in the electrostatic
Coulomb interaction between energetic ions and individual atoms of the material.
This allows substantial amounts of energy and momentum to be transferred to a
singleatomorelectroninawaythatisnotpossiblewithotherprobessuchasener-
geticelectrons,photons,etc.Sincethestartofthedevelopmentofionaccelerators
in the 1930s that were capable of producing high quality ion beams, energetic ion
beammethodshaveplayedaleadingpartattheveryforefrontofthedevelopmentof
ourmodernhightechnologysociety.Thetechnologybehindtheseacceleratorshas
developed in synergy with this technological development of materials. Dedicated
ionimplantationmachinesevolvedfromtheearlyisotopeseparatorsbyadditionof
sophisticatedtargethandlingsystems.Atthesametime,spurredonbythequestfor
higherenergyionsforfundamentalnuclearscience,higherenergymachinesevolved
from the single-ended belt-driven machines to tandem accelerators. Since about
the mid 1970s, more machines were installed for materials research than nuclear
research. The requirements of energy stability and small machines led to intro-
ductionofthepellet-chaincharged(Pelletron)andmorerecentlyrectifier-capacitor
machines(firstusedbyCockroftandWaltoninthebeginningofthe1930s).
Certainly, the development of today’s powerful personal computers and mobile
communications would not have been possible without the use of energetic ion
beams in nanotechnology. At the time of writing this book preface, society is fac-
ingnewchallenges,suchasthedevelopmentofsustainabletechnologies,pandemic
diseasecontrol,andenvironmentalissues.Thebroadrangeofapplicationsandthe
usefulness of nanoscience and -technology methods using ion beams makes them
reallyusefultoolsformeetingthesechallenges.Alreadytheyhavebeenemployed
ix
x
fordevelopingbymutagenisishigh-yieldingandresistantcashcropsanddeveloping
efficientcoatingsforsolarenergyconversion.
Inthiswork,establishedscientistsfromaroundtheworldhavecontributeddeep
knowledgeintheirrespectivefields.Thegoalistoproduceaworkthatisnotonlya
guidetopractitioners,researchers,andstudentsacrossthewholecross-disciplinary
spanofnanoscienceandtechnology,butalsoservestostimulateworkinnewareas
where energetic ion beam methods can contribute to front-line research. Through-
out the book the general recommendations of the International Union of Pure and
AppliedPhysics(IUPAP)aboutunitshavebeenfollowed.
WeareespeciallygratefultoProfessorSirMichaelThompsonforkindlyaccept-
ingourinvitationtowritetheForewardtothisbook.SirMichaelwasoneoftheearly
pioneersinthefieldofionbeamsinnanoscience.Testimonialstohisinfluenceand
relevanceinthefieldarethathisresearchondefectsandradiationdamage,under-
standingofthesputteringprocess,andalsothescatteringofionsfromthesurface
layersinmaterialsarereoccurringthemesinmanycontributionstothisbook.
Lund,Sweden RagnarHellborg
Jvya¨skyla¨,Finland HarryJ.Whitlow
Richland,Washington YanwenZhang
June2009
Contents
PartI TrendsinNanoscienceandTechnology
NanoscaleEngineeringintheBiosciences ............................. 3
DanielJ.WhiteandHarryJ.Whitlow
HighSpeedElectronics ............................................. 21
MikaelO¨stlingandB.GunnarMalm
SurfaceModificationUsingReactiveLandingofMass-SelectedIons ..... 37
PengWangandJuliaLaskin
PartII BasicIon-MatterInteractionsinNanometreScaleMaterials
BasicsofIonScatteringinNanoscaleMaterials ........................ 69
HarryJ.WhitlowandYanwenZhang
Box1:StoppingofIonsinNanomaterials ............................. 87
YanwenZhangandWilliamJ.Weber
Box2:Sputtering .................................................. 95
HansHenrikAndersen
Box3:IonRanges .................................................103
YanwenZhang
ComputerSimulationMethodsforDefectConfigurationsandNanoscale
Structures ........................................................107
FeiGao
CharacterizingNanoscaleCrystalPerfectionbyCrystalMapping .......129
SachikoT.Nakagawa
xi