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About Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond
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Detailed Information
| Author: | Guilei Wang |
|---|---|
| Publication Year: | 2019 |
| Pages: | 127 |
| Language: | English |
| File Size: | 6.362 |
| Format: | |
| Price: | FREE |
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