Table Of ContentErosion and Growth of Solids Stimulated by
Atom and Ion Beams
NATO ASI Series
Advanced Science Institutes Series
A Series presenting the results of activities sponsored by the NATO Science
Committee, which aims at the dissemination of advanced scientific and technological
knowledge, with a view to strengthening links between scientific communities.
The Series is published by an international board of publishers in conjunction with the
NATO Scientific Affairs Division
A Life Sciences Plenum Publishing Corporation
B Physics London and New York
C Mathematical and D. Reidel Publishing Company
Physical Sciences Dordrecht and Boston
D Behavioural and Martinus Nijhoff Publishers
Social Sciences DordrechtlBoston/Lancaster
E Applied Sciences
F Computer and Springer-Verlag
Systems Sciences Berlin/Heidelberg/New York
G Ecological Sciences
Series E: Applied Sciences - No. 112
Erosion and Growth of Solids
Stimulated by Atom and Ion
Beams
edited by
G. Kiriakidis
Physics Department
University of Crete
Heraklion, Crete
Greece
G. Carter
Department of Electronic
and Electrical Engineering
University of Salford
Salford, U.K.
J.L. Whitton
Physics Department
Queen's University
Kingston
Canada
1986 Martinus Nijhoff Publishers
Dordrecht I Boston I Lancaster
Published in cooperation with NATO Scientific Affairs Division
Proceedings of the NATO Advanced Study Institute on Erosion and Growth of Solids
Stimulated by Atom and Ion Beams, Heraklion, Crete, Greece, September 16-27,
1985
Library of Congress Cataloging in Publication Data
ISBN-13: 978-94-010-8468-0 e-ISBN-13: 978-94-009-4422-0
DOI:10.1007/978-94-009-4422-0
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Copyright © 1986 by Martinus Nijhoff Publishers, Dordrecht
Softcover reprint of the hardcover 1s t edition 1986
v
VII
PREFACE
The members of the organising Committee and their
colleagues have, for many years been investigating the evol
ution of the fas'cinating surface features which develop
during sputtering erosion of solids. Such experimental,
theoretical and computational studies have also been carried
out in many international laboratories and, as well as much
cow~onality and agreement, substantial disagreements were
unresolved. In view of the increasing importance of such
processes in technological applications such as microlitho
graphic etching for the patterning of solid state devices and
in fusion technology it was felt opportune to hold a meeting
in this area. Furthermore the use of energetic atomic and ion
fluxes is also becoming of increasing importance in assisting
or modifying the growth of thin films in a number of important
industrial processes and it was therefore rational to combine
the, study of both erosional and growth processes in a single
meeting.
These proceedings include 16 invited review and 15 oral or
poster presented contributions to the NATO Advanced Study
Institute on the "Erosion and Growth of Solids Stimulated by
Atom and Ion Beams". The review contributions span the range
from the fundamental concepts of ballistic sputtering, and how
this influences surface morphology evolution, through processes
involving entrapment of incident species to mechanisms involved
in'the use of chemically reactive ion species. Further reviews
outline the influence of energetic irradiation upon surface
growth by atomic deposition whilst others discuss technologkal
applications of both areas of growth and erosion. These general,
state of the art discussions, are supported by detailed
accounts of relevant studies in the contributed papers.
The proceedings should be of particular interest to those
involved in the morphological, composition and structural
modifications of solid surfaces in such diverse application
areas as microelectronics, coating technology and fusion
reactor development.
v~e would like to express our particular appreciation to the
lecturers and all the participants for their continuous
friendly and effective cooperation throughout the meeting. Als~
our secretary Ms Hara Parasyri who carried much of the
organizational burden with great efficiency. Last but not least
we gratefully acknowledge financial support by the Scientific
Affairs Division of ~lATO and by the following sponsors:
VIII
University of Crete, Greece
Greek Ministry of Research,
Vacuum Science Workshop (VSW), U.K.,
National Science Foundation, U.S.A.,
IBM, U.S.A.,
Bell-Northern Research Ltd, Canada,
Vacuum Generators (VG), U.K.
G. Kiriakidis
G. Carter
J. r1hitton
neraklion, Decew~er 1985
IX
TABLE OF CONTENTS
PREFACE VII
1. W.O. Hofer
Physical Sputtering of Elemental Metals and Semiconductors
2. O.F. Goktepe
Ion Implantation Mechanisms and Related Computational Issues 25
3. R. Kelly and A. Oliva
The Theory of the Preferential Sputtering of Alloys, Including
the Role of Gibbsian Segregation 41
4. G. Carter
Theory of Surface Erosion and Growth 70
5. G. Betz and W. Husinsky
On the Composition of the Sputtered Flux from Metal Targets and
their Compounds 98
6. M.J. Nobes
Geometric Methods of Analysis 103
7. R. Smith and M.A. Tagg
Surface Topographical Evolution: Computational Methods of
Analysis 121
8. B. Baretzky and E. Taglauer
Preferential Sputtering of Tantalum Oxide: Reemission of Helium
and Transient Effects in the Altered Layer 146
9. J.L. Whitton
Experimental Studies of Morphology Development 151
10. L. Tanovic, N. Tanovic, and A. Zalar
Investigation of Microtopography Induced during Sputter Depth
Profiling of Ni/Cr Multilayered Structures 174
11. S.M. Rossnagel
Effects of Surface Impurities and Diffusion on Ion
Bombardment-Induced Topography Formation 181
12. A. van Veen
Ion Trapping and Cluster Growth 200
x
13. B.M.U. Scherzer
Bubbles, Blisters, and Exfoliation 222
14. E. Kay
Examples of Ion Bombardment Effects on Film Growth and Erosion
Processes - Plasma and Beam Experiments 247
15. J.M. Rigsbee, P.A. Scott, R.K. Knipe, and V.F. Hock
On the Modification of Metal/Ceramic Interfaces by Low Energy
Ion/Atom Bombardment during Film Growth 275
16. C.J. Heslop
Plasma Etching for Silicon Device Technology 281
17. S. Dzioba
Reactive Ion Etching of GaAs and Related III-V Compounds 297
18. L. Calliari, F. Giacomozzi, L. Guzman, B. Margesin, and P.M. Ossi
Ion Beam Enhanced Deposition and Dynamic Ion Mixing for Surface
Modification 316
19. A. Christou
Molecular Beam Epitaxy and Selective MBE Deposition of GaAs
Device Structures 324
20. W.L. Brown
Applications of Ion Beams in Microlithography 338
21. J. Salmi, J. Knuutila, and R. Mutikainen
In Situ Ion Beam Processing for Josephson Junction Fabrication 366
22. C.J. McHargue
Effect of Ion Implantation on Subsequent Erosion and Wear
Behavior of Solids 370
23. O. Auciello
Problems, Prospects and Applications of Erosional/Depositional
Phenomena 394
24. S. Kostic, G. Kiriakidis, M.J. Nobes, and G. Carter
The Influence of Incidence Angle on Damage Production in In+ Ion
Implanted Si 423
25. S. Kostic, W. Begemann, G. Carter, D.G. Armour, and M.J. Nobes
Striation Production by Grazing Ion Incidence on Si 430
26. N. Georgoulas
Influence of Lattice Defects Produced by Ion Implantation on
Electrical and Optical Properties of Bulk-Barrier-Diodes 435
27. W. Huang, J. Onsgaard, and M. Szymonski
Influence of the Target Environment on Angular Distribution of
Sputtered Particles 440
XI
28. J.A. Kubby and B.M. Siegel
Simulation of Near Atomic Scale Sputter Induced Morphology 444
29. G. Kozlowski and A. Ciszewski
Epitaxy of Erbium on Tungsten 453
30. C. Pellet, C. Schwebel, F. Meyer, and G. Gautherin
Growth of Thin Films by UHV Ion Beam Sputtering Deposition
Technique 457
31. L.D. Stephenson, V.F. Hock, J.M. Rigsbee, D. Teer, and D. Arnell
Microstructural Analysis of Electronically Conductive Ceramic
Coatings Synthesized by Reactive Ion Plating and Sputter
Deposition 461
