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About Damage formation and annealing studies of low energy ion implants in silicon using medium ...
Objective, preparation, analysis techniques and equipment. 11. 1.6. Scope of the End of Range defects and their evolution upon annealing. 51. 3.4.3 Surface modification and alloying by laser, ion and electron beams, Editors J.M.. Poate
Detailed Information
| Author: | Phil Edmondson |
|---|---|
| Publication Year: | 2006 |
| Pages: | 211 |
| Language: | English |
| File Size: | 4.85 |
| Format: | |
| Price: | FREE |
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