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About Cmos Fabrication
This document provides an overview of thin film deposition processes used in microfabrication. It discusses various thin film deposition techniques including physical vapor deposition (PVD) methods like evaporation and sputtering as well as chemical vapor deposition (CVD) methods such as low-pressure CVD, plasma-enhanced CVD, and atomic layer deposition. For each method, it describes the basic process, characteristics, advantages and disadvantages. It also provides examples of thin film applications in semiconductor device fabrication.
Detailed Information
| Author: | ['Rohith Raj'] |
|---|---|
| Publication Year: | 2015 |
| Pages: | 57 |
| Language: | English |
| Format: | |
| Price: | FREE |
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