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About Chemical Vapour Deposition
This document discusses thin film deposition using chemical vapor deposition (CVD). It outlines the differences between CVD and physical vapor deposition (PVD), with CVD providing more conformal and multidiirectional deposition compared to the highly directional deposition of PVD. The document discusses the advantages and disadvantages of CVD, including its ability to deposit uniform films over large areas and its higher costs due to safety and purity concerns when using hazardous precursor gases. It also summarizes the basic physics and types of CVD, including low-pressure CVD, plasma-enhanced CVD, and high-density plasma CVD.
Detailed Information
| Author: | ['Isaen Dzul'] |
|---|---|
| Publication Year: | 2014 |
| Pages: | 24 |
| Language: | English |
| Format: | |
| Price: | FREE |
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