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About Chemical Etching: Created in COMSOL Multiphysics 5.4
This model simulates the wet chemical etching of a copper substrate. It considers the transport of an etching chemical species via convection and diffusion, the laminar fluid flow over the etched cavity, and the deformation of the cavity geometry over time according to the local etching rate. The simulation shows how the etching rate and cavity shape evolve non-uniformly due to the asymmetric flow profile of the etching solution.
Detailed Information
| Author: | ['Василь Іванина'] |
|---|---|
| Publication Year: | 2021 |
| Pages: | 14 |
| Language: | English |
| Format: | |
| Price: | FREE |
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