Table Of ContentADVANCES IN
UNCONVENTIONAL
LITHOGRAPHY
Edited by Gorgi Kostovski
Advances in Unconventional Lithography
Edited by Gorgi Kostovski
Published by InTech
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Copyright © 2011 InTech
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First published October, 2011
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Advances in Unconventional Lithography, Edited by Gorgi Kostovski
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ISBN 978-953-307-607-2
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Contents
Preface IX
Part 1 Nanoimprint Lithographies 1
Chapter 1 Soft UV Nanoimprint Lithography:
A Tool to Design Plasmonic Nanobiosensors 3
Grégory Barbillon
Part 2 Lithographies for Biological Applications 15
Chapter 2 Application of Soft Lithography
and Micro-Fabrication on Neurobiology 17
Gao Kan, Chen Haifeng, Liu Bing-Fang and Xu Qun-Yuan
Chapter 3 Toward the Precise Control of Cell Differentiation
Processes by Using Micro and Soft Lithography 35
Yuzo Takayama, Hiroyuki Moriguchi, Kiyoshi Kotani,
Takafumi Suzuki, Kunihiko Mabuchi and Yasuhiko Jimbo
Part 3 Self-Assembled Colloidal Substrates for Nanofabrication 51
Chapter 4 Fabrication of Surfaces with Bimodal Roughness
Through Polyelectrolyte/Colloid Assembly 53
Christine C. Dupont-Gillain, Cristèle J. Nonckreman,
Yasmine Adriaensen and Paul G. Rouxhet
Chapter 5 Physical Deposition Assisted Colloidal Lithography:
A Technique to Ordered Micro/Nanostructured Arrays 71
Yue Li, Shuyan Gao, Guotao Duan,
Naoto Koshizaki and Weiping Cai
Part 4 Periodic Structures for Diffractive
Optics and Surface Wetting 117
Chapter 6 Design of Circular Dammann Grating:
Fabrication and Analysis 119
Fung Jacky Wen and Po Sheun Chung
VI Contents
Chapter 7 Fabrication of Binary Diffractive Lens on
Optical Films by Electron Beam Lithography 139
Atsushi Motogaito and Kazumasa Hiramatsu
Chapter 8 Photocontrolled Reversible Dimensional
Changes of Microstructured Photochromic Polymers 149
Despina Fragouli, Roberto Cingolani and Athanassia Athanassiou
Part 5 Extreme UV Lithography 165
Chapter 9 Approach to EUV Lithography Simulation 167
Atsushi Sekiguchi
Preface
The term Lithography encompasses a range of contemporary technologies for micro
and nano scale fabrication. Originally driven by evolution of the semiconductor
industry, lithography has grown from its optical origins to demonstrate increasingly
fine resolution and to permeate many diverse research fields. Today, greater flexibility
and affordability is demanded from lithography than ever before. Diverse needs
across many disciplines have produced a multitude of innovative new lithography
techniques. This book provides an overview of some of the varied approaches and
applications of lithography today.
Nano-imprint lithography is regarded a one of the most competitive alternative
fabrication technologies available today. It offers exceptional resolution, high
throughput and simple execution at very low cost. The first section of this book, by
Barbillon, provides an introduction to nano-imprinting by describing the fabrication of
nano-structures for plasmonic biosensing.
Soft lithographies, derived from nano-imprint technologies, operate at largely ambient
environmental conditions. This makes them inherently compatible with delicate
biological materials such as proteins. Section 2 describes the application of soft
lithography in the context of neurobiology. The work by Kan et al. investigates
techniques for directing the growth of neurons, with the intention of creating complex
neural networks of specific geometry. Similarly, Takayama et al. explore techniques
for controlling the differentiation of stem cells.
Self-assembly techniques are often employed for their capacity to pattern large
substrate areas with nanoscale resolution at a very low cost. Colloids are a well
established platform in the self-assembly arena, and have been applied in areas as
diverse as photonic crystals and nanoscale plasmonics. In Section 3, sub-micron
colloidal particles are employed as nonplanar substrates for the controlled deposition
of a second tier of self-assembled nano-structures. Nonckreman et al. pursue this
objective by demonstrating the controlled deposition of nano-sized colloids on top of
sub-micron colloids, while Li et al. investigate the self-assembled nano-structuring of
thin films as they are deposited on top of close-packed colloids.
Diffractive optical elements typically require fabrication of periodic sub-wavelength
elements. For the visible spectrum, this typically translates to sub-micron and
X Preface
nanoscale dimensions. In Section 4, Wen et al. investigate the design and fabrication of
circular Dammann diffractive gratings, while Motogaito et al. demonstrate binary
diffractive lenses via electron beam lithography. Finally, Fragouli et al. bring this
section to a close by demonstrating very interesting work with photochromic
polymers. These are imprinted with grating structures, and then shown to be capable
of reversible dimensional changes when illuminated with specific wavelengths. Their
application to tuneable wetting and tuneable diffraction is also demonstrated.
Section 5 concludes this book by describing some of the challenges faced by the next
generation optical lithography technique. Here, shorter wavelengths, in the extreme
ultraviolet regime, are harnessed to enable enhanced nanoscale fabrication.
This book represents the collective efforts and creative talents of many researchers
worldwide. On behalf of these authors, and the staff at InTech publishing, I hope that
you find these collected works informative, and a pleasure to read.
Gorgi Kostovski
RMIT University
Australia
