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About 1 s2.0 S1386947703006325 Main PDF
The document summarizes a study on the fabrication of double quantum dots using a combination of atomic force microscopy (AFM) and electron-beam lithography. Specifically: - Parallel double quantum dots are produced using local anodic oxidation (LAO) via AFM to define islands and tunnel barriers. Additional split gates are added using electron-beam lithography for control of interdot coupling. - The fabrication process is described, which combines LAO via AFM with electron-beam lithography in multiple steps. Alignment between the techniques is crucial and achieved using marker structures. - Low-temperature transport measurements demonstrate tunable double dot behavior, with separate Coulomb blockade peaks for each dot observed at a certain negative
Detailed Information
| Author: | ['Djo Ko Vich'] |
|---|---|
| Publication Year: | 2013 |
| Pages: | 4 |
| Language: | English |
| Format: | |
| Price: | FREE |
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