Micro- and Nanopatterning Polymers

385 Pages·1998·29.43 MB·English

by  Hiroshi Ito

Micro- and Nanopatterning
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In Micro- and Nanopatterning Polymers; Ito, H., et al.;
ACS Symposium Series; American Chemical Society: Washington, DC, 1998.
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In Micro- and Nanopatterning Polymers; Ito, H., et al.;
ACS Symposium Series; American Chemical Society: Washington, DC, 1998.
ACS SYMPOSIUM SERIES 706
Micro- and Nanopatterning
Polymers
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Developed from a symposium sponsored by the
Division of Polymeric Materials: Science and Engineering
at the 214th ACS National Meeting
Las Vegas, Nevada,
September 7-11, 1997
American Chemical Society, Washington, DC
In Micro- and Nanopatterning Polymers; Ito, H., et al.;
ACS Symposium Series; American Chemical Society: Washington, DC, 1998.
Library of Congress Cataloging-in-Publication Data
Micro- and nanopatterning polymers / Hiroshi Ito, editor ... [et al.].
p. cm.—(ACS symposium series, ISSN 0097-6156 ; 706)
"Developed from a symposium sponsored by the Division of Polymeric
Materials: Science and Engineering at the 214th ACS National Meeting, Las
Vegas, Nevada, September 7-11, 1997."
org w001 Includes bibliographical references and index.
pubs.acs.8-0706.f I1S.B MNic 0ro-8el4ec1t2ro-3n5ic8s—1-M3 aterials. 2. Polymeric composites. 3. Photoresists—
http://k-199 Materials.
2 | 1/b I. Ito, Hiroshi. II. American Chemical Society. Division of Polymeric
12 Materials: Science and Engineering. III. American Chemical Society. Meeting
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35.42 omber 1, The paper used in this publication meets the minimum requirements of American National Standard for
3.e Information Sciences—Permanence of Paper for Printed Library Materials, ANSI Z39.48-1984.
9.16Sept
by 8ate: Copyright © 1998 American Chemical Society
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PRINTED IN THE UNITED STATES OF AMERICA
In Micro- and Nanopatterning Polymers; Ito, H., et al.;
ACS Symposium Series; American Chemical Society: Washington, DC, 1998.
Advisory Board
ACS Symposium Series
Mary E. Castellion Omkaram Nalamasu
ChemEdit Company AT&T Bell Laboratories
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In Micro- and Nanopatterning Polymers; Ito, H., et al.;
ACS Symposium Series; American Chemical Society: Washington, DC, 1998.
Foreword
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ACS BOOKS DEPARTMENT
In Micro- and Nanopatterning Polymers; Ito, H., et al.;
ACS Symposium Series; American Chemical Society: Washington, DC, 1998.
Preface
r olymers have played an important role in the electronics industry as compo­
nent structures and in manufacturing of microelectronics devices such as micro­
g 01 processors and memory chips. The wide-spread use of polymeric materials
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p://pub1998-0 Fteucrhthneorlmogoyr ein, pealettcetrrnoinnigc doef vsiucceh m paonluyfmacetruicr imnga.t erials in a jim-nm scale is a key
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3.e of 256-megabit random access memory and related logic devices are now ex­
9.16Sept pected to support 1-gigabit (175-nm) and even 4-gigabit (150-nm) generations in
by 8ate: the near future. Thus, refinement of chemically amplified 248-nm resists is
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opment of new chemically amplified resists, spawning a massive research effort
and providing enormous challenges and opportunities to resist chemists and en­
gineers. X-ray and electron-beam lithographic technologies are also expected to
come into the scene in the not-far future.
In parallel to the fast progress of the "conventional" lithographic technol­
ogy, new polymeric materials must also be developed for new patterning tech­
nologies for process simplication, environmental consideration, and so on.
Furthermore, the patterning technology is not confined in the electronics indus­
try but finds its use in other areas such as biology and medicine.
We hope that this volume provides valuable information on the current
status, future directions, challenges, and opportunities in the area of polymeric
materials for use in |Lim-and nm-scale patterning.
xi
In Micro- and Nanopatterning Polymers; Ito, H., et al.;
ACS Symposium Series; American Chemical Society: Washington, DC, 1998.
Acknowledgments
This volume is based on the symposium "Polymeric Materials for Micro- and
Nano-Patterning Science and Technology," which was sponsored by the Ameri­
can Chemical Society (ACS) Division of Polymeric Materials: Science and En­
gineering, Inc. (PMSE), and held in Las Vegas in September 1997. We thank
the PMSE Division for sponsoring the symposium, the authors for their valuable
contributions to both the symposium and this volume, and the referees for care­
fully reviewing the manuscripts. Financial support for the symposium was pro­
g 01 vided by Olin Microelectronic Materials, Inc., Hoechst-Celanese, Inc.,
cs.or6.pr0 SEMATECH, Lucent Technologies Bell Laboratories, IBM, the PMSE Divi­
s.a70 sion, and the Petroleum Research Fund administered by ACS, which is grate­
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p://pu1998- fully Oaucr knsionwcelered gtehda. nks are also extended to Anne Wilson, Tracie Barnes, and
2 | htt1/bk- the production staff of the ACS Books Department for their efforts in assem­
12 bling the volume.
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ber 31, doi: 10. HIROSHI ITO
Octo98 | IBM Almaden Research Center
n 19 650 Harry Road
5.42 ober 1, San Jose, CA 95120
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DowPubli OMKARAM NALAMASU

Bell Laboratories, Lucent Technologies
600 Mountain Avenue
Murray Hill, NJ 07974
TAKUMI UENO
Hitachi, Ltd.
Hitachi Research Laboratory
1-1 Omika-cho 7-Chome
Hitachi, Ibaraki 319-12, Japan
In Micro- and Nanopatterning Polymers; Ito, H., et al.;
ACS Symposium Series; American Chemical Society: Washington, DC, 1998.
Chapter 1
Lithography with a Pattern of Block Copolymer
Microdomains as a Positive or Negative Resist
Christopher Harrison1, Miri Park1, Paul M. Chaikin1, Richard A. Register2, and
Douglas H. Adamson3
g 01
orh0 1Department of Physics, 2Department of Chemical Engineering, and 3Princeton
s.acs.706.c Materials Institute, Princeton University, Princeton, NJ 08544
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Recent advances in photolithography have pushed the feature size down to 150
nm in production processes(7), and even smaller feature sizes have been reported
in experimental research(2,5,4). However, dramatic improvements in the circuit
density with photolithographic processes are not anticipated because the
minimum feature size is limited by the wavelength of light, typically 193 or 248
nm in current processes. As an alternative to photolithography, self-assembled
structures, such as monolayers of spheres or cylinders(5,6), have been advanced
by researchers due to their nanoscopic feature sizes and the control demonstrated
in uniformly coating substrates. Though these morphologies do not allow one
2 ©1998 American Chemical Society
In Micro- and Nanopatterning Polymers; Ito, H., et al.;
ACS Symposium Series; American Chemical Society: Washington, DC, 1998.