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Advances in Research and Development, Volume 23: Modeling of Film Deposition for Microelectronic Applications (Thin Films) PDF

331 Pages·1997·14.979 MB·English
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Download Advances in Research and Development, Volume 23: Modeling of Film Deposition for Microelectronic Applications (Thin Films) PDF Free - Full Version

by Maurice H. Francombe, John L. Vossen| 1997| 331 pages| 14.979| English

About Advances in Research and Development, Volume 23: Modeling of Film Deposition for Microelectronic Applications (Thin Films)

Significant progress has occurred during the last few years in device technologies and these are surveyed in this new volume. Included are Si/(Si-Ge) heterojunctions for high-speed integrated circuits, Schottky-barrier arrays in Si and Si-Ge alloys for infrared imaging, III-V quantum-well detector structures operated in the heterodyne mode for high-data-rate communications, and III-V heterostructures and quantum-wells for infrared emissions.

Detailed Information

Author:Maurice H. Francombe, John L. Vossen
Publication Year:1997
ISBN:9780080542904
Pages:331
Language:English
File Size:14.979
Format:PDF
Price:FREE
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